A robust process for the fabrication of field emission backlights

B. Marquardt, C. S. Cojucaru, S. Xavier, P. Legagneux, P. Pribat

Research output: Contribution to journalConference articlepeer-review

Abstract

In this paper, we present a novel process for the realization of large area, low cost field emission cathodes. The process makes use of alumina substrates, which are anodically oxidized in order to yield porous structures capable of hosting metal catalyst nanoparticles. By carefully controlling the final stage of the anodisation as well as the electrodeposition conditions, it is possible to fine tune the density of such catalysts in the range of 10 8-109/cm2 . The catalytic growth of CNTs is subsequently performed at low temperature (∼ 600°C or below, thanks to the use of H20), using plasma enhanced chemical vapour deposition. There is no lithography need to make the cathode and current densities of ∼ ImA/cm2 are easily obtained.

Original languageEnglish
Pages (from-to)1606-1609
Number of pages4
JournalProceedings of International Meeting on Information Display
Volume8
Publication statusPublished - 1 Dec 2008
Event8th International Meeting on Information Display - International Display Manufacturing Conference 2008 and Asia Display 2008, IMID/IDMC/ASIA DISPLAY 2008 - Ilsan, Korea, Republic of
Duration: 13 Oct 200817 Oct 2008

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