Abstract
The reaction of H atoms with SiCl4 was studied behind reflected shock waves at temperatures between 1530 K and 1730 K and pressures around 1.5 bar by applying atomic resonance absorption spectroscopy (ARAS) for time resolved measurements of H atoms at the Lα -line. The thermal decomposition of a few ppm ethyl iodide (C2H5l) was used as a H- atom source. In the presence of a high excess of the molecular reactant SiCl4 a slow consumption of H was observed, which follows a pseudo-first-order rate law. Rate coefficient for the consumption of H by the reaction: H + SiCl4 →klSiCl3 + HCl (R1) was determined to be: kl = 1.4 × 1013 exp(-4800 K/T) cm3 mol-1 s-1.
| Original language | English |
|---|---|
| Pages (from-to) | 469-472 |
| Number of pages | 4 |
| Journal | International Journal of Chemical Kinetics |
| Volume | 29 |
| Issue number | 6 |
| DOIs | |
| Publication status | Published - 1 Jan 1997 |