A study of various coatings for MSGCs

V. Mack; J. M. Brom; J. C. Fontaine; D. Huss; J. P. Schunck; A. Zghiche

doi:10.1016/S0168-9002(98)01285-6

A study of various coatings for MSGCs

V. Mack
, J. M. Brom
, J. C. Fontaine
, D. Huss
, J. P. Schunck
, A. Zghiche

Université de Haute Alsace
Université Paris-Sud
Institut de Mécanique des Fluides

Research output: Contribution to journal › Article › peer-review

Abstract

We present some test results of microstrip gas chambers with boro-silicate glass substrates, which were coated before the photolithographic processing. We compare various coatings: sputtered S8900 glass and three coatings made by industrial companies (SURMET, VITO and ICMC). The composition and electrical properties of the different materials are discussed. Gain, current and rate capability are compared with those obtained from identical uncoated glass substrates.

Original language	English
Pages (from-to)	369-375
Number of pages	7
Journal	Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment
Volume	423
Issue number	2-3
DOIs	https://doi.org/10.1016/S0168-9002(98)01285-6
Publication status	Published - 1 Mar 1999
Externally published	Yes

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Cite this

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title = "A study of various coatings for MSGCs",

abstract = "We present some test results of microstrip gas chambers with boro-silicate glass substrates, which were coated before the photolithographic processing. We compare various coatings: sputtered S8900 glass and three coatings made by industrial companies (SURMET, VITO and ICMC). The composition and electrical properties of the different materials are discussed. Gain, current and rate capability are compared with those obtained from identical uncoated glass substrates.",

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AU - Mack, V.

AU - Brom, J. M.

AU - Fontaine, J. C.

AU - Huss, D.

AU - Schunck, J. P.

AU - Zghiche, A.

PY - 1999/3/1

Y1 - 1999/3/1

N2 - We present some test results of microstrip gas chambers with boro-silicate glass substrates, which were coated before the photolithographic processing. We compare various coatings: sputtered S8900 glass and three coatings made by industrial companies (SURMET, VITO and ICMC). The composition and electrical properties of the different materials are discussed. Gain, current and rate capability are compared with those obtained from identical uncoated glass substrates.

AB - We present some test results of microstrip gas chambers with boro-silicate glass substrates, which were coated before the photolithographic processing. We compare various coatings: sputtered S8900 glass and three coatings made by industrial companies (SURMET, VITO and ICMC). The composition and electrical properties of the different materials are discussed. Gain, current and rate capability are compared with those obtained from identical uncoated glass substrates.

U2 - 10.1016/S0168-9002(98)01285-6

DO - 10.1016/S0168-9002(98)01285-6

M3 - Article

AN - SCOPUS:0033098690

SN - 0168-9002

VL - 423

SP - 369

EP - 375

JO - Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment

JF - Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment

IS - 2-3

ER -

A study of various coatings for MSGCs

Abstract

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