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A uniaxial tensile stress apparatus for temperature-dependent magnetotransport and optical studies of thin films

  • A. C.H. Rowe
  • , K. Fasanella
  • , D. R. Hines
  • , T. Zhou
  • , S. A. Solin
  • NEC Research Institute
  • Washington University in St. Louis

Research output: Contribution to journalArticlepeer-review

Abstract

The description of a uniaxial tensile stress apparatus for studying the temperature-dependent magnetotransport and optical properties of thin films was presented. The studies were performed in the temperature range of 4.2 to 300 K and in magnetic fields up to 7 T. The induced strain was measured by monitoring the position of a laser beam reflected off the surface of the strained sample.

Original languageEnglish
Pages (from-to)4270-4276
Number of pages7
JournalReview of Scientific Instruments
Volume73
Issue number12
DOIs
Publication statusPublished - 1 Dec 2002
Externally publishedYes

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