All-Around SiN Stressor for High and Homogeneous Tensile Strain in Germanium Microdisk Cavities

  • Abdelhamid Ghrib
  • , Moustafa El Kurdi
  • , Mathias Prost
  • , Sébastien Sauvage
  • , Xavier Checoury
  • , Grégoire Beaudoin
  • , Marc Chaigneau
  • , Razvigor Ossikovski
  • , Isabelle Sagnes
  • , Philippe Boucaud

Research output: Contribution to journalArticlepeer-review

Abstract

An all-around stressor approach is presented to introduce homogeneous and high tensile strain, both in-plane and vertically, into n-doped germanium microdisks. A maximum biaxial strain up to 1.5% is achieved, close to the requirement to obtain a direct band gap germanium. The possibilities to obtain in this configuration modal optical gain in germanium microdisk cavities are discussed.

Original languageEnglish
Pages (from-to)353-358
Number of pages6
JournalAdvanced Optical Materials
Volume3
Issue number3
DOIs
Publication statusPublished - 1 Mar 2015

Keywords

  • Germanium
  • Microdisks
  • Silicon photonics
  • Strain engineering

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