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Apparent doping-dependence of the a-Si:H/c-Si interface degradation upon ITO sputtering

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Abstract

In this work, we address the doping dependence of SHJ solar cell precursor passivation degradation upon ITO sputtering by PVD. We report the higher apparent sensitivity of the emitter. By varying the doping, we were able to demonstrate that the emitter is not necessarily less resilient to this process. Indeed the same amount of defects can be created on the BSF side all the while remaining screened thanks to the highly effective field-effect provided by the capping n-doped a-Si:H layer.

Original languageEnglish
Title of host publication2014 IEEE 40th Photovoltaic Specialist Conference, PVSC 2014
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages645-648
Number of pages4
ISBN (Electronic)9781479943982
DOIs
Publication statusPublished - 15 Oct 2014
Event40th IEEE Photovoltaic Specialist Conference, PVSC 2014 - Denver, United States
Duration: 8 Jun 201413 Jun 2014

Publication series

Name2014 IEEE 40th Photovoltaic Specialist Conference, PVSC 2014

Conference

Conference40th IEEE Photovoltaic Specialist Conference, PVSC 2014
Country/TerritoryUnited States
CityDenver
Period8/06/1413/06/14

Keywords

  • ITO
  • amorphous silicon
  • crystalline silicon
  • degradation
  • heterojunction
  • passivation

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