CF2 kinetics and related mechanisms in the presence of polymers in fluorocarbon plasmas

A. D. Tserepi; J. Derouard; J. P. Booth; N. Sadeghi

doi:10.1063/1.364255

CF₂ kinetics and related mechanisms in the presence of polymers in fluorocarbon plasmas

A. D. Tserepi
, J. Derouard
, J. P. Booth
, N. Sadeghi

LTHE (UMR 5564 CNRS/IRD/Université de Grenoble)
Institut Universitaire de France

Research output: Contribution to journal › Article › peer-review

40 Citations (Scopus)

Abstract

Laser-induced fluorescence was used to characterize the fluorocarbon plasma that was used to modify the wettability of hexatriacontane (HTC), a polymer model. The plasma volume downstream from a microwave plasma source was examined by monitoring the CF₂ concentration as well as the CF₂ decay rate (in the afterglow of a pulsed discharge) during treatment of the polymer surface (in 20-100 mTorr CF₄). In parallel, the behavior of F atoms was monitored by means of actinometric optical emission. Pulsed modulation of the discharge allowed the effects of variations in the loss and production rates for CF₂ to be distinguished, in the presence of hexatriacontane. Our observations are consistent with enhanced production of CF₂, possibly by an ion-assisted surface mechanism, in the presence of HTC.

Original language	English
Pages (from-to)	2124-2130
Number of pages	7
Journal	Journal of Applied Physics
Volume	81
Issue number	5
DOIs	https://doi.org/10.1063/1.364255
Publication status	Published - 1 Mar 1997
Externally published	Yes

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title = "CF2 kinetics and related mechanisms in the presence of polymers in fluorocarbon plasmas",

abstract = "Laser-induced fluorescence was used to characterize the fluorocarbon plasma that was used to modify the wettability of hexatriacontane (HTC), a polymer model. The plasma volume downstream from a microwave plasma source was examined by monitoring the CF2 concentration as well as the CF2 decay rate (in the afterglow of a pulsed discharge) during treatment of the polymer surface (in 20-100 mTorr CF4). In parallel, the behavior of F atoms was monitored by means of actinometric optical emission. Pulsed modulation of the discharge allowed the effects of variations in the loss and production rates for CF2 to be distinguished, in the presence of hexatriacontane. Our observations are consistent with enhanced production of CF2, possibly by an ion-assisted surface mechanism, in the presence of HTC.",

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AU - Tserepi, A. D.

AU - Derouard, J.

AU - Booth, J. P.

AU - Sadeghi, N.

PY - 1997/3/1

Y1 - 1997/3/1

N2 - Laser-induced fluorescence was used to characterize the fluorocarbon plasma that was used to modify the wettability of hexatriacontane (HTC), a polymer model. The plasma volume downstream from a microwave plasma source was examined by monitoring the CF2 concentration as well as the CF2 decay rate (in the afterglow of a pulsed discharge) during treatment of the polymer surface (in 20-100 mTorr CF4). In parallel, the behavior of F atoms was monitored by means of actinometric optical emission. Pulsed modulation of the discharge allowed the effects of variations in the loss and production rates for CF2 to be distinguished, in the presence of hexatriacontane. Our observations are consistent with enhanced production of CF2, possibly by an ion-assisted surface mechanism, in the presence of HTC.

AB - Laser-induced fluorescence was used to characterize the fluorocarbon plasma that was used to modify the wettability of hexatriacontane (HTC), a polymer model. The plasma volume downstream from a microwave plasma source was examined by monitoring the CF2 concentration as well as the CF2 decay rate (in the afterglow of a pulsed discharge) during treatment of the polymer surface (in 20-100 mTorr CF4). In parallel, the behavior of F atoms was monitored by means of actinometric optical emission. Pulsed modulation of the discharge allowed the effects of variations in the loss and production rates for CF2 to be distinguished, in the presence of hexatriacontane. Our observations are consistent with enhanced production of CF2, possibly by an ion-assisted surface mechanism, in the presence of HTC.

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DO - 10.1063/1.364255

M3 - Article

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SN - 0021-8979

VL - 81

SP - 2124

EP - 2130

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 5

ER -

CF2 kinetics and related mechanisms in the presence of polymers in fluorocarbon plasmas

Abstract

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CF₂ kinetics and related mechanisms in the presence of polymers in fluorocarbon plasmas