Characterization and optimization of magnetron sputtered Sc/Si multilayers for extreme ultraviolet optics

J. Gautier; F. Delmotte; F. Bridou; M. F. Ravet; F. Varniere; M. Roulliay; A. Jerome; I. Vickridge

doi:10.1007/s00339-007-4041-6

Characterization and optimization of magnetron sputtered Sc/Si multilayers for extreme ultraviolet optics

J. Gautier
, F. Delmotte
, F. Bridou
, M. F. Ravet
, F. Varniere
, M. Roulliay
, A. Jerome
, I. Vickridge

Research output: Contribution to journal › Article › peer-review

Abstract

Scandium/silicon multilayers have been deposited by magnetron sputtering and characterized by several techniques. Experimental peak reflectances of 0.22 and 0.37 have been measured respectively at wavelengths of 40 nm and 46 nm, for 10° incidence angle. The corresponding theoretical values for a perfect Sc/Si structure are respectively 0.38 and 0.57. In order to explain these differences between calculated and measured reflectivity, thin film and multilayer characterizations have been done. Effects of multilayer imperfections on the reflectivity have been estimated independently by means of simulation. Based on these results, a new design of Sc/Si multilayer is proposed with top layer thickness optimization. With this design, the experimental peak reflectance reaches 0.46 at a wavelength of 46 nm.

Original language	English
Pages (from-to)	719-725
Number of pages	7
Journal	Applied Physics A: Materials Science and Processing
Volume	88
Issue number	4
DOIs	https://doi.org/10.1007/s00339-007-4041-6
Publication status	Published - 1 Sept 2007
Externally published	Yes

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@article{2f9fc39072db4d17a29ef7c3bb305513,

title = "Characterization and optimization of magnetron sputtered Sc/Si multilayers for extreme ultraviolet optics",

abstract = "Scandium/silicon multilayers have been deposited by magnetron sputtering and characterized by several techniques. Experimental peak reflectances of 0.22 and 0.37 have been measured respectively at wavelengths of 40 nm and 46 nm, for 10° incidence angle. The corresponding theoretical values for a perfect Sc/Si structure are respectively 0.38 and 0.57. In order to explain these differences between calculated and measured reflectivity, thin film and multilayer characterizations have been done. Effects of multilayer imperfections on the reflectivity have been estimated independently by means of simulation. Based on these results, a new design of Sc/Si multilayer is proposed with top layer thickness optimization. With this design, the experimental peak reflectance reaches 0.46 at a wavelength of 46 nm.",

author = "J. Gautier and F. Delmotte and F. Bridou and Ravet, \{M. F.\} and F. Varniere and M. Roulliay and A. Jerome and I. Vickridge",

year = "2007",

month = sep,

day = "1",

doi = "10.1007/s00339-007-4041-6",

language = "English",

volume = "88",

pages = "719--725",

journal = "Applied Physics A: Materials Science and Processing",

issn = "0947-8396",

number = "4",

}

TY - JOUR

T1 - Characterization and optimization of magnetron sputtered Sc/Si multilayers for extreme ultraviolet optics

AU - Gautier, J.

AU - Delmotte, F.

AU - Bridou, F.

AU - Ravet, M. F.

AU - Varniere, F.

AU - Roulliay, M.

AU - Jerome, A.

AU - Vickridge, I.

PY - 2007/9/1

Y1 - 2007/9/1

N2 - Scandium/silicon multilayers have been deposited by magnetron sputtering and characterized by several techniques. Experimental peak reflectances of 0.22 and 0.37 have been measured respectively at wavelengths of 40 nm and 46 nm, for 10° incidence angle. The corresponding theoretical values for a perfect Sc/Si structure are respectively 0.38 and 0.57. In order to explain these differences between calculated and measured reflectivity, thin film and multilayer characterizations have been done. Effects of multilayer imperfections on the reflectivity have been estimated independently by means of simulation. Based on these results, a new design of Sc/Si multilayer is proposed with top layer thickness optimization. With this design, the experimental peak reflectance reaches 0.46 at a wavelength of 46 nm.

AB - Scandium/silicon multilayers have been deposited by magnetron sputtering and characterized by several techniques. Experimental peak reflectances of 0.22 and 0.37 have been measured respectively at wavelengths of 40 nm and 46 nm, for 10° incidence angle. The corresponding theoretical values for a perfect Sc/Si structure are respectively 0.38 and 0.57. In order to explain these differences between calculated and measured reflectivity, thin film and multilayer characterizations have been done. Effects of multilayer imperfections on the reflectivity have been estimated independently by means of simulation. Based on these results, a new design of Sc/Si multilayer is proposed with top layer thickness optimization. With this design, the experimental peak reflectance reaches 0.46 at a wavelength of 46 nm.

U2 - 10.1007/s00339-007-4041-6

DO - 10.1007/s00339-007-4041-6

M3 - Article

AN - SCOPUS:34547286470

SN - 0947-8396

VL - 88

SP - 719

EP - 725

JO - Applied Physics A: Materials Science and Processing

JF - Applied Physics A: Materials Science and Processing

IS - 4

ER -

Characterization and optimization of magnetron sputtered Sc/Si multilayers for extreme ultraviolet optics

Abstract

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