Abstract
An investigation was made of the initial stages of chemisorption of Al and Ga on the clean GaAs (110) surface by applying quantum chemical methods to small clusters representing Al or Ga on GaAs (110). These calculations suggest that at smallest coverages Al or Ga bind to a surface Ga atom; for higher coverages Al and the surface Ga interchange positions. The binding energy, the chemical shifts of the Ga-3d, As-3d and Al-2p states, and the microscopic dipole associated with chemisorption of Al or Ga on GaAs (110) have been obtained. These results are compared to experimental values and further experiments are suggested.
| Original language | English |
|---|---|
| Pages (from-to) | 869-873 |
| Number of pages | 5 |
| Journal | J Vac Sci Technol |
| Volume | 17 |
| Issue number | 5 |
| DOIs | |
| Publication status | Published - 1 Jan 1980 |
| Externally published | Yes |
| Event | Proc of the Annu Conf on the Phys of Compd Semicond Interfaces, 7th - Estes Park, CO, USA Duration: 29 Jan 1980 → 31 Jan 1980 |
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