CHEMISORPTION OF OXYGEN AND ALUMINUM ON THE GaAs (110) SURFACE FROM AB INITIO THEORY.

  • John J. Barton
  • , Coenraad A. Swarts
  • , William A. Goddard
  • , T. C. McGill

Research output: Contribution to journalConference articlepeer-review

Abstract

Quantum chemical methods are applied to the structure of the clean GaAs (110) surface and the chemisorption of oxygen and aluminum. It is found that results for small clusters give geometries for the clean surface in agreement with those observed experimentally. It is proposed that an intermediate stage of oxidation would exist in which the O atom binds to a surface As. The investigation shows that the initial site of Al chemisorbed on GaAs (110) has the Al bonded to the surface Ga. Geometries and chemical shifts are reported for both O and Al on GaAs (110). The chemical shifts are in agreement with recent experimental results.

Original languageEnglish
Pages (from-to)164-168
Number of pages5
JournalJ Vac Sci Technol
Volume17
Issue number1
DOIs
Publication statusPublished - 1 Jan 1979
Externally publishedYes
EventProc of the Natl Symp of the Am Vac Soc, 26th - New York, NY, USA
Duration: 1 Oct 19795 Oct 1979

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