Chlorine dissociation fraction in an inductively coupled plasma measured by ultraviolet absorption spectroscopy

François Neuilly; Jean Paul Booth; Laurent Vallier

doi:10.1116/1.1430247

Chlorine dissociation fraction in an inductively coupled plasma measured by ultraviolet absorption spectroscopy

François Neuilly
, Jean Paul Booth
, Laurent Vallier

Philips Research
Lab. Technol. de la Microlectron.

Research output: Contribution to journal › Article › peer-review

Abstract

Inductively coupled chlorine plasmas were studied by ultraviolet absorption spectroscopy. The absolute dissociation degree of Cl₂ was measured over a wide range of pressures and source powers. The Cl₂ dissociation rate increased with the injected source power. At higher pressure, the electron temperature was lower. A simple global model showed good agreement with the measurements.

Original language	English
Pages (from-to)	225-229
Number of pages	5
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	20
Issue number	1
DOIs	https://doi.org/10.1116/1.1430247
Publication status	Published - 1 Jan 2002

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title = "Chlorine dissociation fraction in an inductively coupled plasma measured by ultraviolet absorption spectroscopy",

abstract = "Inductively coupled chlorine plasmas were studied by ultraviolet absorption spectroscopy. The absolute dissociation degree of Cl2 was measured over a wide range of pressures and source powers. The Cl2 dissociation rate increased with the injected source power. At higher pressure, the electron temperature was lower. A simple global model showed good agreement with the measurements.",

author = "Fran{\c c}ois Neuilly and Booth, \{Jean Paul\} and Laurent Vallier",

year = "2002",

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AU - Neuilly, François

AU - Booth, Jean Paul

AU - Vallier, Laurent

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N2 - Inductively coupled chlorine plasmas were studied by ultraviolet absorption spectroscopy. The absolute dissociation degree of Cl2 was measured over a wide range of pressures and source powers. The Cl2 dissociation rate increased with the injected source power. At higher pressure, the electron temperature was lower. A simple global model showed good agreement with the measurements.

AB - Inductively coupled chlorine plasmas were studied by ultraviolet absorption spectroscopy. The absolute dissociation degree of Cl2 was measured over a wide range of pressures and source powers. The Cl2 dissociation rate increased with the injected source power. At higher pressure, the electron temperature was lower. A simple global model showed good agreement with the measurements.

UR - https://www.scopus.com/pages/publications/0036166062

U2 - 10.1116/1.1430247

DO - 10.1116/1.1430247

M3 - Article

AN - SCOPUS:0036166062

SN - 0734-2101

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JO - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

JF - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

IS - 1

ER -

Chlorine dissociation fraction in an inductively coupled plasma measured by ultraviolet absorption spectroscopy

Abstract

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