Coherent modeling and measurement of anisotropic multilayer stack using conventional ellipsometry applications

A mathematical model is presented for characterizing anisotropic multilayer stacks using conventional spectroscopic ellipsometry in standard configurations [1,2]. Development of the monochromatic plane wave propagation is presented in the special case of uncoupled parallel (p) and perpendicular (s) polarizations. Past models have required the use of special equipment and measurement configuration involving complex data processing making the characterization inaccessible in many circumstances. By way of example, the algorithm is then employed to characterize polished uniaxial anisotropic sapphire slabs, uncoated and coated λ/4-wave plate (3-layer anti-reflective coating) and an uncoated biaxial anisotropic polypropylene. Measurements are obtained from phase modulated spectroscopic ellipsometry in the visible and ultraviolet range.