Compact, high resolution, four wave lateral shearing interferometer

Research output: Contribution to journalConference articlepeer-review

Abstract

A simple, ultra-compact, four wave achromatic interferometric technique is used to measure with high accuracy and high transverse resolution wavefront of polychromatic lightsource. The wave front to be measured is replicated by a diffraction grating into four copies interfering together leading to an interference pattern very similar to the intensity distribution obtained in the focal plane of a Shack-Hartmann microlens array. The grating is made of optical glass modulated in depth on top of which a chromium mask is printed. The amplitude mask acts like a Hartmann plate. Used in association with the phase mask, it allows suppression of the unwanted zero and second orders. A CCD detector located in the vicinity of the grating records the interference pattern. This new wavefront sensor is able to resolve wavefront spatial frequencies 3 to 4 times higher than a conventional Shack-Hartmann technique using an equivalent CCD detector. Its dynamic is also much higher.

Original languageEnglish
Pages (from-to)282-292
Number of pages11
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume5252
DOIs
Publication statusPublished - 3 May 2004
EventOptical Fabrication, Testing, and Metrology - St. Etienne, France
Duration: 30 Sept 20033 Oct 2003

Keywords

  • Hartmann mask
  • Interferometry
  • Shack-Hartmann
  • Wave front sensing

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