Abstract
A simple, ultra-compact, four wave achromatic interferometric technique is used to measure with high accuracy and high transverse resolution wavefront of polychromatic lightsource. The wave front to be measured is replicated by a diffraction grating into four copies interfering together leading to an interference pattern very similar to the intensity distribution obtained in the focal plane of a Shack-Hartmann microlens array. The grating is made of optical glass modulated in depth on top of which a chromium mask is printed. The amplitude mask acts like a Hartmann plate. Used in association with the phase mask, it allows suppression of the unwanted zero and second orders. A CCD detector located in the vicinity of the grating records the interference pattern. This new wavefront sensor is able to resolve wavefront spatial frequencies 3 to 4 times higher than a conventional Shack-Hartmann technique using an equivalent CCD detector. Its dynamic is also much higher.
| Original language | English |
|---|---|
| Pages (from-to) | 282-292 |
| Number of pages | 11 |
| Journal | Proceedings of SPIE - The International Society for Optical Engineering |
| Volume | 5252 |
| DOIs | |
| Publication status | Published - 3 May 2004 |
| Event | Optical Fabrication, Testing, and Metrology - St. Etienne, France Duration: 30 Sept 2003 → 3 Oct 2003 |
Keywords
- Hartmann mask
- Interferometry
- Shack-Hartmann
- Wave front sensing