Abstract
We present a systematic study of the preparation and properties of porous silicon obtained by anodic etching of device-grade hydrogenated amorphous silicon. Highly luminescent porous material is produced from boron-doped films and, by hole injection, from undoped films. A striking difference between amorphous and crystalline Si lies in an electrochemical instability which limits the maximum obtainable thickness in porous material. The luminescence mechanism for porous a-Si:H appears to be markedly different from that of its crystalline counterpart.
| Original language | English |
|---|---|
| Pages (from-to) | 1885-1888 |
| Number of pages | 4 |
| Journal | Physical Review Letters |
| Volume | 77 |
| Issue number | 9 |
| DOIs | |
| Publication status | Published - 1 Jan 1996 |
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