Abstract
This article reports the improvement of broad area lasers epitaxially grown on InP(311)B substrate. Thanks to optimized growth techniques, a high density of uniformly sized InAs quantum dots (QDs) up to 1011 cm-2 is obtained. The device, which contains only two stacks of QDs, exhibits a ground state laser emission at 1.54 μm at room temperature associated with a threshold current density as low as 1.70 A/cm2. Experimental results also demonstrate a modal gain greater than 8 cm-1 per QD plane.
| Original language | English |
|---|---|
| Pages (from-to) | 6903-6905 |
| Number of pages | 3 |
| Journal | Japanese Journal of Applied Physics |
| Volume | 46 |
| Issue number | 10 A |
| DOIs | |
| Publication status | Published - 9 Oct 2007 |
Keywords
- InP substrate
- Quantum dots
- Semiconductor laser