Design and fabrication of photonic crystal thin film photovoltaic cells

Guillaume Gomard; Ounsi El Daif; Emmanuel Drouard; Xianqin Meng; Anne Kaminski; Alain Fave; Mustapha Lemiti; Enric Garcia-Caurel; Pere Roca I Cabarrocas; Christian Seassal

doi:10.1117/12.854383

Design and fabrication of photonic crystal thin film photovoltaic cells

Guillaume Gomard
, Ounsi El Daif
, Emmanuel Drouard
, Xianqin Meng
, Anne Kaminski
, Alain Fave
, Mustapha Lemiti
, Enric Garcia-Caurel
, Pere Roca I Cabarrocas
, Christian Seassal

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Abstract

We present the integration of an absorbing planar photonic crystal within a thin film photovoltaic cell. The devices are based on a stack including a hydrogenated amorphous silicon P-i-N junction surrounded by TCO layers, with a back metallic contact. Optical simulations exhibit a significant increase of the integrated absorption in the 300-720nm wavelength range. The global electro-optical characteristics of such a new solar cell, and the impact of surface passivation, are also discussed. Carrier generation rate maps calculated by optical simulations are introduced as input data in a commercial electrical simulation software. The fabrication of such a device is finally addressed, with a specific focus on the use of low cost nanopatterning processes compatible with large areas.

Original language	English
Title of host publication	Photonics for Solar Energy Systems III
Publisher	SPIE
ISBN (Print)	9780819481986
DOIs	https://doi.org/10.1117/12.854383
Publication status	Published - 1 Jan 2010
Event	Photonics for Solar Energy Systems III - Brussels, Belgium Duration: 13 Apr 2010 → 15 Apr 2010

Publication series

Name	Proceedings of SPIE - The International Society for Optical Engineering
Volume	7725
ISSN (Print)	0277-786X

Conference

Conference	Photonics for Solar Energy Systems III
Country/Territory	Belgium
City	Brussels
Period	13/04/10 → 15/04/10

Keywords

Hydrogenated amorphous silicon
Photonic crystal
Photovoltaic solar cell
Thin film solar cell

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

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10.1117/12.854383

Cite this

Gomard, G., El Daif, O., Drouard, E., Meng, X., Kaminski, A., Fave, A., Lemiti, M., Garcia-Caurel, E., Roca I Cabarrocas, P., & Seassal, C. (2010). Design and fabrication of photonic crystal thin film photovoltaic cells. In Photonics for Solar Energy Systems III Article 77250M (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 7725). SPIE. https://doi.org/10.1117/12.854383

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title = "Design and fabrication of photonic crystal thin film photovoltaic cells",

abstract = "We present the integration of an absorbing planar photonic crystal within a thin film photovoltaic cell. The devices are based on a stack including a hydrogenated amorphous silicon P-i-N junction surrounded by TCO layers, with a back metallic contact. Optical simulations exhibit a significant increase of the integrated absorption in the 300-720nm wavelength range. The global electro-optical characteristics of such a new solar cell, and the impact of surface passivation, are also discussed. Carrier generation rate maps calculated by optical simulations are introduced as input data in a commercial electrical simulation software. The fabrication of such a device is finally addressed, with a specific focus on the use of low cost nanopatterning processes compatible with large areas.",

keywords = "Hydrogenated amorphous silicon, Photonic crystal, Photovoltaic solar cell, Thin film solar cell",

author = "Guillaume Gomard and \{El Daif\}, Ounsi and Emmanuel Drouard and Xianqin Meng and Anne Kaminski and Alain Fave and Mustapha Lemiti and Enric Garcia-Caurel and \{Roca I Cabarrocas\}, Pere and Christian Seassal",

year = "2010",

month = jan,

day = "1",

doi = "10.1117/12.854383",

language = "English",

isbn = "9780819481986",

series = "Proceedings of SPIE - The International Society for Optical Engineering",

publisher = "SPIE",

booktitle = "Photonics for Solar Energy Systems III",

note = "Photonics for Solar Energy Systems III ; Conference date: 13-04-2010 Through 15-04-2010",

}

Gomard, G, El Daif, O, Drouard, E, Meng, X, Kaminski, A, Fave, A, Lemiti, M, Garcia-Caurel, E, Roca I Cabarrocas, P & Seassal, C 2010, Design and fabrication of photonic crystal thin film photovoltaic cells. in Photonics for Solar Energy Systems III., 77250M, Proceedings of SPIE - The International Society for Optical Engineering, vol. 7725, SPIE, Photonics for Solar Energy Systems III, Brussels, Belgium, 13/04/10. https://doi.org/10.1117/12.854383

Design and fabrication of photonic crystal thin film photovoltaic cells. / Gomard, Guillaume; El Daif, Ounsi; Drouard, Emmanuel et al.
Photonics for Solar Energy Systems III. SPIE, 2010. 77250M (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 7725).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

TY - GEN

T1 - Design and fabrication of photonic crystal thin film photovoltaic cells

AU - Gomard, Guillaume

AU - El Daif, Ounsi

AU - Drouard, Emmanuel

AU - Meng, Xianqin

AU - Kaminski, Anne

AU - Fave, Alain

AU - Lemiti, Mustapha

AU - Garcia-Caurel, Enric

AU - Roca I Cabarrocas, Pere

AU - Seassal, Christian

PY - 2010/1/1

Y1 - 2010/1/1

N2 - We present the integration of an absorbing planar photonic crystal within a thin film photovoltaic cell. The devices are based on a stack including a hydrogenated amorphous silicon P-i-N junction surrounded by TCO layers, with a back metallic contact. Optical simulations exhibit a significant increase of the integrated absorption in the 300-720nm wavelength range. The global electro-optical characteristics of such a new solar cell, and the impact of surface passivation, are also discussed. Carrier generation rate maps calculated by optical simulations are introduced as input data in a commercial electrical simulation software. The fabrication of such a device is finally addressed, with a specific focus on the use of low cost nanopatterning processes compatible with large areas.

AB - We present the integration of an absorbing planar photonic crystal within a thin film photovoltaic cell. The devices are based on a stack including a hydrogenated amorphous silicon P-i-N junction surrounded by TCO layers, with a back metallic contact. Optical simulations exhibit a significant increase of the integrated absorption in the 300-720nm wavelength range. The global electro-optical characteristics of such a new solar cell, and the impact of surface passivation, are also discussed. Carrier generation rate maps calculated by optical simulations are introduced as input data in a commercial electrical simulation software. The fabrication of such a device is finally addressed, with a specific focus on the use of low cost nanopatterning processes compatible with large areas.

KW - Hydrogenated amorphous silicon

KW - Photonic crystal

KW - Photovoltaic solar cell

KW - Thin film solar cell

U2 - 10.1117/12.854383

DO - 10.1117/12.854383

M3 - Conference contribution

AN - SCOPUS:77953733406

SN - 9780819481986

T3 - Proceedings of SPIE - The International Society for Optical Engineering

BT - Photonics for Solar Energy Systems III

PB - SPIE

T2 - Photonics for Solar Energy Systems III

Y2 - 13 April 2010 through 15 April 2010

ER -

Design and fabrication of photonic crystal thin film photovoltaic cells

Abstract

Publication series

Conference

Keywords

UN SDGs

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