Dynamic and transient analysis of silicon-based thin-film transistors: Channel propagation model

  • Jong W. Jin
  • , Jean Charles Vanel
  • , Dmitri Daineka
  • , Tayeb Mohammed-Brahim
  • , Yvan Bonnassieux

Research output: Contribution to journalArticlepeer-review

Abstract

The quasi-static approach in the dynamic modeling considers that a thin-film transistor (TFT) reaches the steady-state instantaneously, and how to insert its behavior before steady-state is an important issue. In this paper, dynamic responses of silicon-based TFTs under gate-voltage pulse are studied in details. We experimentally distinguish quasi-static and non-quasi-static cases and we identify two charging regimes of the channel formation: channel propagation and charging of the fully propagated channel. We propose a model for the channel propagation, with a compact model-like approach to take into account the effect of defect states.

Original languageEnglish
Article number6479318
Pages (from-to)871-876
Number of pages6
JournalIEEE/OSA Journal of Display Technology
Volume9
Issue number11
DOIs
Publication statusPublished - 19 Mar 2013

Keywords

  • Channel formation
  • Delay time
  • Dynamic measurement
  • Intrinsic capacitances
  • Non-quasi-static model
  • Thin-film transistor (TFT)
  • Transient

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