@inproceedings{66b17a39831b46ab823c763fe5d85669,
title = "Effects of roughness on scatterometry signatures",
abstract = "We used azimuthally-resolved spectroscopic Mueller matrix ellipsometry to study a periodic silicon line structure with and without artificially-generated line edge roughness (LER). Grating profiles were determined from multiple azimuthal configurations, focusing the incident beam into a 60 μm spot. We used rigorous numerical modeling, taking into account the finite numerical aperture and determining the profile shape using a four trapezoid model for the line profile. Data obtained from the perturbed and unperturbed gratings were fit using the same model, and the resulting root-mean-square error (RMSE) values were compared. The comparison shows an increase in RMSE values for the perturbed grating that can be attributed to the effects of LER.",
keywords = "Diffraction grating, Ellipsometry, Line edge roughness, Mueller matrix, Multi-azimuth method",
author = "M. Foldyna and Germer, \{T. A.\} and Bergner, \{B. C.\}",
year = "2011",
month = dec,
day = "1",
doi = "10.1063/1.3657865",
language = "English",
isbn = "9780735409651",
series = "AIP Conference Proceedings",
pages = "49--53",
booktitle = "Frontiers of Characterization and Metrology for Nanoelectronics",
note = "Frontiers of Characterization and Metrology for Nanoelectronics: 2011 ; Conference date: 23-05-2011 Through 26-05-2011",
}