Electrochemical growth gold buffer layer on H-Si(111) surfaces and their applications

  • P. Allongue
  • , F. Maroun
  • , H. Jurca
  • , R. Cortès
  • , P. Prod'homme
  • , N. Tourneriè

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

This paper reviews our recent work about gold electrodeposition on H-terminated Si(lll). It is shown that Au(lll)/Si(lll) epitaxial layers are grown and that the film morphology can be varied according to the deposition conditions (potential and solution pH). At pH = 14 (cyanide solution) selective gold nucleation at the substrate monatomic step edges is observed. A homogeneous nucleation is obtained at pH 4 (chloride solution). In the former case 3D growth occurs and in the latter case ultra smooth buffer layers are obtained. Application of these substrates to formation of magnetic nanostructures with tuneable properties is demonstrated.

Original languageEnglish
Title of host publicationECS Transactions - State-of-the-Art Program on Compound Semiconductors 50 (SOTAPOCS 50)and Processes at the Semiconductor Solution Interface 3
PublisherElectrochemical Society Inc.
Pages197-207
Number of pages11
Edition3
ISBN (Electronic)9781607680611
ISBN (Print)9781566777117
DOIs
Publication statusPublished - 1 Jan 2009
Event50th State-of-the-Art Symposium on Compound Semiconductors, SOTAPOCS 50 and 3rd International Symposium on Processes at the Semiconductor-Solution Interface, PSSI 3 - 215th ECS Meeting - San Francisco, CA, United States
Duration: 24 May 200929 May 2009

Publication series

NameECS Transactions
Number3
Volume19
ISSN (Print)1938-5862
ISSN (Electronic)1938-6737

Conference

Conference50th State-of-the-Art Symposium on Compound Semiconductors, SOTAPOCS 50 and 3rd International Symposium on Processes at the Semiconductor-Solution Interface, PSSI 3 - 215th ECS Meeting
Country/TerritoryUnited States
CitySan Francisco, CA
Period24/05/0929/05/09

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