@inproceedings{55c069b2a8754aec9cd2d501897be704,
title = "Electrochemically formed porous silica as a template for metal electrodeposition",
abstract = "Mesoporous silica films can be obtained by high-potential anodic treatment of silicon in a dilute fluoride electrolyte. The electrochemical deposition of metals in this porous medium has been investigated. The electrochemical deposition of copper turns out to be difficult, which is probably due to the formation of a poorly adherent deposit. In contrast, nickel is deposited in the porous medium. The obtained structures exhibit enhanced SEM contrast, which allows for a direct confirmation of the stratified structure of porous silica previously inferred from X-ray reflectivity data. This stratified structure is clearly associated with the known oscillatory electrochemical behavior of silicon electrodes in fluoride electrolyte.",
author = "Chazalviel, \{J. N.\} and F. Ozanam",
year = "2009",
month = jan,
day = "1",
doi = "10.1149/1.3318511",
language = "English",
isbn = "9781566778008",
series = "ECS Transactions",
publisher = "Electrochemical Society Inc.",
number = "27",
pages = "131--137",
booktitle = "Semiconductors, Metal Oxides, and Composites",
edition = "27",
}