Abstract
Photodetachment microscopy of the negative ions Si- and F- has made it possible to measure the electron affinities of silicon and fluorine with improved accuracy. The new recommended electron affinities of 28Si and 19F are 11207.252(18) and 27432.446(19) cm-1, i.e. 1.389 5220(24) and 3.401 1895(25) eV, respectively.
| Original language | English |
|---|---|
| Pages (from-to) | L281-L288 |
| Journal | Journal of Physics B: Atomic, Molecular and Optical Physics |
| Volume | 34 |
| Issue number | 9 |
| DOIs | |
| Publication status | Published - 14 May 2001 |