Abstract
The electronic structure of the first stage of epitaxial growth of iron on Si(111)7 x 7 is investigated by photoelectron and soft X-ray absorption spectroscopy. The Fe/Si interfaces, obtained by means of solid-phase epitaxy, are studied for various coverages and as a function of the annealing temperature. These studies give some insight into the properties of the interface formation of FeSi2.
| Original language | English |
|---|---|
| Pages (from-to) | 800-805 |
| Number of pages | 6 |
| Journal | Applied Surface Science |
| Volume | 65-66 |
| Issue number | C |
| DOIs | |
| Publication status | Published - 2 Mar 1993 |
| Externally published | Yes |
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