Enhanced absorption and plasmon excitation in the bulk of fused silica with femtosecond Bessel beams

C. Xie, R. Giust, J. Zhang, V. Jukna, R. Meyer, L. Furfaro, M. Jacquot, L. Froehly, J. M. Dudley, A. Couairon, F. Courvoisier

Research output: Contribution to journalConference articlepeer-review

Abstract

We image femtosecond Bessel beam propagation in fused silica under ablation conditions, and observe unexpectedly high absorption. We identify plasmon excitation and plasma channel field enhancement as the likely mechanism for this increased absorption.

Original languageEnglish
Article numberSTh3Q.2
JournalOptics InfoBase Conference Papers
Publication statusPublished - 1 Jan 2016
Externally publishedYes
EventCLEO: Science and Innovations, SI 2016 - San Jose, United States
Duration: 5 Jun 201610 Jun 2016

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