Euv and hard x-ray hartmann wavefront sensing for optical metrology, alignment and phase imaging

  • Ombeline de La Rochefoucauld
  • , Guillaume Dovillaire
  • , Fabrice Harms
  • , Mourad Idir
  • , Lei Huang
  • , Xavier Levecq
  • , Martin Piponnier
  • , Philippe Zeitoun

Research output: Contribution to journalArticlepeer-review

Abstract

For more than 15 years, Imagine Optic have developed Extreme Ultra Violet (EUV) and X-ray Hartmann wavefront sensors for metrology and imaging applications. These sensors are compatible with a wide range of X-ray sources: from synchrotrons, Free Electron Lasers, laser-driven betatron and plasma-based EUV lasers to High Harmonic Generation. In this paper, we first describe the principle of a Hartmann sensor and give some key parameters to design a high-performance sensor. We also present different applications from metrology (for manual or automatic alignment of optics), to soft X-ray source optimization and X-ray imaging.

Original languageEnglish
Article number874
Pages (from-to)1-19
Number of pages19
JournalSensors (Switzerland)
Volume21
Issue number3
DOIs
Publication statusPublished - 1 Feb 2021

Keywords

  • EUV wavefront sensor
  • Hartmann sensor
  • Metrology
  • Phase imaging
  • X-ray sources
  • X-ray wavefront sensor

Fingerprint

Dive into the research topics of 'Euv and hard x-ray hartmann wavefront sensing for optical metrology, alignment and phase imaging'. Together they form a unique fingerprint.

Cite this