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Evidence of bimodal crystallite size distribution in μc-Si:H films

  • Institut polytechnique de Paris
  • Indian Institute of Technology Kanpur
  • Indian Space Research Organisation

Research output: Contribution to journalArticlepeer-review

Abstract

We report on the microstructural characterization studies carried out on plasma deposited highly crystalline undoped microcrystalline silicon films to explore the crystallite size distribution present in this material. The modeling of results of spectroscopic ellipsometry using two different sized crystallites is corroborated by the deconvolution of experimental Raman profiles using a modeling method that incorporates a bimodal size distribution of crystallites. The presence of a bimodal size distribution of crystallites is demonstrated as well by the results of atomic force microscopy and X-ray diffraction studies. The qualitative agreement between the results of different studies is discussed.

Original languageEnglish
Pages (from-to)34-37
Number of pages4
JournalMaterials Science and Engineering: B
Volume159-160
Issue numberC
DOIs
Publication statusPublished - 15 Mar 2009

Keywords

  • Atomic force microscopy (AFM)
  • Ellipsometry
  • Raman spectroscopy
  • Silicon
  • Structural properties
  • Thin films

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