Fabrication and field emission properties of vertically aligned carbon nanotubes

Y. Bonnassieux; C. S. Cojocaru; A. Dhar; P. Legagneux

Fabrication and field emission properties of vertically aligned carbon nanotubes

Y. Bonnassieux
, C. S. Cojocaru
, A. Dhar
, P. Legagneux

Institut polytechnique de Paris
Thales Research & Technology

Research output: Contribution to conference › Paper › peer-review

Abstract

In this paper, we present some comparisons concerning field emission as well as processing parameters from two types of nanostructures, namely multiwall carbon nanotubes grown by plasma enhanced chemical vapor deposition and metal nanowires grown by electrochemical deposition in porous membranes. Various treatments are presented, either during or after deposition, in order to decrease the growth temperature and to improve the uniformity of the emitted current. All the processes presented here are relatively simple and potentially low cost and could be applied to LCD backlighting applications in the near future.

Original language	English
Pages	1561-1563
Number of pages	3
Publication status	Published - 1 Dec 2010
Event	17th International Display Workshops, IDW'10 - Fukuoka, Japan Duration: 1 Dec 2010 → 3 Dec 2010

Conference

Conference	17th International Display Workshops, IDW'10
Country/Territory	Japan
City	Fukuoka
Period	1/12/10 → 3/12/10

Cite this

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title = "Fabrication and field emission properties of vertically aligned carbon nanotubes",

abstract = "In this paper, we present some comparisons concerning field emission as well as processing parameters from two types of nanostructures, namely multiwall carbon nanotubes grown by plasma enhanced chemical vapor deposition and metal nanowires grown by electrochemical deposition in porous membranes. Various treatments are presented, either during or after deposition, in order to decrease the growth temperature and to improve the uniformity of the emitted current. All the processes presented here are relatively simple and potentially low cost and could be applied to LCD backlighting applications in the near future.",

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year = "2010",

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AU - Bonnassieux, Y.

AU - Cojocaru, C. S.

AU - Dhar, A.

AU - Legagneux, P.

PY - 2010/12/1

Y1 - 2010/12/1

N2 - In this paper, we present some comparisons concerning field emission as well as processing parameters from two types of nanostructures, namely multiwall carbon nanotubes grown by plasma enhanced chemical vapor deposition and metal nanowires grown by electrochemical deposition in porous membranes. Various treatments are presented, either during or after deposition, in order to decrease the growth temperature and to improve the uniformity of the emitted current. All the processes presented here are relatively simple and potentially low cost and could be applied to LCD backlighting applications in the near future.

AB - In this paper, we present some comparisons concerning field emission as well as processing parameters from two types of nanostructures, namely multiwall carbon nanotubes grown by plasma enhanced chemical vapor deposition and metal nanowires grown by electrochemical deposition in porous membranes. Various treatments are presented, either during or after deposition, in order to decrease the growth temperature and to improve the uniformity of the emitted current. All the processes presented here are relatively simple and potentially low cost and could be applied to LCD backlighting applications in the near future.

M3 - Paper

AN - SCOPUS:79956300064

SP - 1561

EP - 1563

T2 - 17th International Display Workshops, IDW'10

Y2 - 1 December 2010 through 3 December 2010

ER -

Fabrication and field emission properties of vertically aligned carbon nanotubes

Abstract

Conference

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