First demonstration of a 1.52 νm RT InAs/InP(3 1 1)B laser with an active zone based on a single QD layer

  • E. Homeyer
  • , R. Piron
  • , F. Grillot
  • , O. Dehaese
  • , K. Tavernier
  • , E. MacÉ
  • , A. Le Corre
  • , S. Loualiche

Research output: Contribution to journalArticlepeer-review

Abstract

This paper presents experimental results obtained on a laser structure containing a single QD layer, epitaxially grown on InP(3 1 1)B substrate. The sample shows laser emission on the ground state in the 1.55 νm telecommunication window at room temperature. Its threshold current density is 320 A cm-2, which is relatively low for an InP-based QD laser. Its modal gain, attributed to a high QD density and low QD size dispersion, explains this first achievement of lasing with a single QD layer on an InP substrate.

Original languageEnglish
Article number028
Pages (from-to)827-830
Number of pages4
JournalSemiconductor Science and Technology
Volume22
Issue number7
DOIs
Publication statusPublished - 1 Jul 2007
Externally publishedYes

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