TY - JOUR
T1 - Fundamental insights into the threshold characteristics of organic field-effect transistors
AU - Jung, Sungyeop
AU - Kim, Chang Hyun
AU - Bonnassieux, Yvan
AU - Horowitz, Gilles
N1 - Publisher Copyright:
© 2015 IOP Publishing Ltd.
PY - 2015/1/28
Y1 - 2015/1/28
N2 - We physically model the threshold characteristics of organic field-effect transistors (OFETs) using a two-dimensional finite-element method. The transfer characteristics are simulated for staggered OFETs with various electronic structures. A reliable method to extract a structure-unique threshold voltage is presented based on the second-derivative method. By changing the hole injection barrier height in such a manner that the flat-band voltage, defined from the difference of Fermi levels of gate and source electrode, is kept constant, we demonstrate a direct impact of the hole injection barrier height on the threshold voltage. Simulated charge carrier distribution shows the two-dimensional nature of channel creation process and physical insights into the threshold characteristics of OFETs.
AB - We physically model the threshold characteristics of organic field-effect transistors (OFETs) using a two-dimensional finite-element method. The transfer characteristics are simulated for staggered OFETs with various electronic structures. A reliable method to extract a structure-unique threshold voltage is presented based on the second-derivative method. By changing the hole injection barrier height in such a manner that the flat-band voltage, defined from the difference of Fermi levels of gate and source electrode, is kept constant, we demonstrate a direct impact of the hole injection barrier height on the threshold voltage. Simulated charge carrier distribution shows the two-dimensional nature of channel creation process and physical insights into the threshold characteristics of OFETs.
KW - Numerical simulation
KW - Organic field-effect transistors (OFETs)
KW - Threshold characteristics
U2 - 10.1088/0022-3727/48/3/035106
DO - 10.1088/0022-3727/48/3/035106
M3 - Article
AN - SCOPUS:84920812272
SN - 0022-3727
VL - 48
JO - Journal of Physics D: Applied Physics
JF - Journal of Physics D: Applied Physics
IS - 3
M1 - 035106
ER -