Gas phase and surface kinetics in plasma and hot filament-enhanced catalytic chemical vapor deposition of carbon nanostructures

F. Le Normand; M. Gulas; P. Veis; C. S. Cojocaru; J. E. Bourée

doi:10.1016/j.tsf.2009.01.079

Gas phase and surface kinetics in plasma and hot filament-enhanced catalytic chemical vapor deposition of carbon nanostructures

F. Le Normand
, M. Gulas
, P. Veis
, C. S. Cojocaru
, J. E. Bourée

Research output: Contribution to journal › Article › peer-review

Abstract

Simulations of the gas phase chemistry (C₂H₂/H₂) coupled with surface reactions for the catalytic growth of carbon nanostructures (nanotubes/nanofibers), using different activation modes of catalytic chemical vapor deposition (CCVD) process, are presented. Deposits issued from thermal CCVD, hot-filament CCVD, plasma-enhanced CCVD and plasma-enhanced combined with hot-filament CCVD are compared to simulations of the gas phase and surface kinetics. The influence of the activation elements is described in detail. According to these simulations taking into account optical emission spectroscopy data, gas phase composition and linear growth rate of tubular nanostructures are predicted in good agreement with the experimental observations.

Original language	English
Pages (from-to)	3466-3471
Number of pages	6
Journal	Thin Solid Films
Volume	517
Issue number	12
DOIs	https://doi.org/10.1016/j.tsf.2009.01.079
Publication status	Published - 30 Apr 2009

Keywords

Carbon nanotubes
Gas phase kinetics
Hot-wire chemical vapor deposition
Surface kinetics

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10.1016/j.tsf.2009.01.079

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title = "Gas phase and surface kinetics in plasma and hot filament-enhanced catalytic chemical vapor deposition of carbon nanostructures",

abstract = "Simulations of the gas phase chemistry (C2H2/H2) coupled with surface reactions for the catalytic growth of carbon nanostructures (nanotubes/nanofibers), using different activation modes of catalytic chemical vapor deposition (CCVD) process, are presented. Deposits issued from thermal CCVD, hot-filament CCVD, plasma-enhanced CCVD and plasma-enhanced combined with hot-filament CCVD are compared to simulations of the gas phase and surface kinetics. The influence of the activation elements is described in detail. According to these simulations taking into account optical emission spectroscopy data, gas phase composition and linear growth rate of tubular nanostructures are predicted in good agreement with the experimental observations.",

keywords = "Carbon nanotubes, Gas phase kinetics, Hot-wire chemical vapor deposition, Surface kinetics",

author = "\{Le Normand\}, F. and M. Gulas and P. Veis and Cojocaru, \{C. S.\} and Bour{\'e}e, \{J. E.\}",

year = "2009",

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day = "30",

doi = "10.1016/j.tsf.2009.01.079",

language = "English",

volume = "517",

pages = "3466--3471",

journal = "Thin Solid Films",

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TY - JOUR

T1 - Gas phase and surface kinetics in plasma and hot filament-enhanced catalytic chemical vapor deposition of carbon nanostructures

AU - Le Normand, F.

AU - Gulas, M.

AU - Veis, P.

AU - Cojocaru, C. S.

AU - Bourée, J. E.

PY - 2009/4/30

Y1 - 2009/4/30

N2 - Simulations of the gas phase chemistry (C2H2/H2) coupled with surface reactions for the catalytic growth of carbon nanostructures (nanotubes/nanofibers), using different activation modes of catalytic chemical vapor deposition (CCVD) process, are presented. Deposits issued from thermal CCVD, hot-filament CCVD, plasma-enhanced CCVD and plasma-enhanced combined with hot-filament CCVD are compared to simulations of the gas phase and surface kinetics. The influence of the activation elements is described in detail. According to these simulations taking into account optical emission spectroscopy data, gas phase composition and linear growth rate of tubular nanostructures are predicted in good agreement with the experimental observations.

AB - Simulations of the gas phase chemistry (C2H2/H2) coupled with surface reactions for the catalytic growth of carbon nanostructures (nanotubes/nanofibers), using different activation modes of catalytic chemical vapor deposition (CCVD) process, are presented. Deposits issued from thermal CCVD, hot-filament CCVD, plasma-enhanced CCVD and plasma-enhanced combined with hot-filament CCVD are compared to simulations of the gas phase and surface kinetics. The influence of the activation elements is described in detail. According to these simulations taking into account optical emission spectroscopy data, gas phase composition and linear growth rate of tubular nanostructures are predicted in good agreement with the experimental observations.

KW - Carbon nanotubes

KW - Gas phase kinetics

KW - Hot-wire chemical vapor deposition

KW - Surface kinetics

U2 - 10.1016/j.tsf.2009.01.079

DO - 10.1016/j.tsf.2009.01.079

M3 - Article

AN - SCOPUS:64649103591

SN - 0040-6090

VL - 517

SP - 3466

EP - 3471

JO - Thin Solid Films

JF - Thin Solid Films

IS - 12

ER -

Gas phase and surface kinetics in plasma and hot filament-enhanced catalytic chemical vapor deposition of carbon nanostructures

Abstract

Keywords

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