TY - JOUR
T1 - Global (volume-averaged) model of inductively coupled chlorine plasma
T2 - Influence of Cl wall recombination and external heating on continuous and pulse-modulated plasmas
AU - Kemaneci, Efe
AU - Carbone, Emile
AU - Booth, Jean Paul
AU - Graef, Wouter
AU - Van Dijk, Jan
AU - Kroesen, Gerrit
PY - 2014/1/1
Y1 - 2014/1/1
N2 - An inductively coupled radio-frequency plasma in chlorine is investigated via a global (volume-averaged) model, both in continuous and square wave modulated power input modes. After the power is switched off (in a pulsed mode) an ion-ion plasma appears. In order to model this phenomenon, a novel quasi-neutrality implementation is proposed. Several distinct Cl wall recombination probability measurements exist in the literature, and their effect on the simulation data is compared. We also investigated the effect of the gas temperature that was imposed over the range 300-1500K, not calculated self-consistently. Comparison with published experimental data from several sources for both continuous and pulsed modes shows good agreement with the simulation results.
AB - An inductively coupled radio-frequency plasma in chlorine is investigated via a global (volume-averaged) model, both in continuous and square wave modulated power input modes. After the power is switched off (in a pulsed mode) an ion-ion plasma appears. In order to model this phenomenon, a novel quasi-neutrality implementation is proposed. Several distinct Cl wall recombination probability measurements exist in the literature, and their effect on the simulation data is compared. We also investigated the effect of the gas temperature that was imposed over the range 300-1500K, not calculated self-consistently. Comparison with published experimental data from several sources for both continuous and pulsed modes shows good agreement with the simulation results.
KW - atomic and molecular physics
KW - chemical physics and physical chemistry
KW - plasma physics
U2 - 10.1088/0963-0252/23/4/045002
DO - 10.1088/0963-0252/23/4/045002
M3 - Article
AN - SCOPUS:84902769637
SN - 0963-0252
VL - 23
JO - Plasma Sources Science and Technology
JF - Plasma Sources Science and Technology
IS - 4
M1 - 045002
ER -