Growth of graphene films by plasma enhanced chemical vapour deposition

Laurent Baraton, Laurent Gangloff, Stéphane Xavier, Costel Sorin Cojocaru, Vincent Hue, Pierre Legagneux, Young Hee Lee, Didier Pribatta

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Since it was isolated in 2004, graphene, the first known 2D crystal, is the object of a growing interest, due to the range of its possible applications as well as its intrinsic properties. From large scale electronics and photovoltaics to spintronics and fundamental quantum phenomena, graphene films have attracted a large community of researchers. But bringing graphene to industrial applications will require a reliable, low cost and easily scalable synthesis process. In this paper we present a new growth process based on plasma enhanced chemical vapor deposition. Furthermore, we show that, when the substrate is an oxidized silicon wafer covered by a nickel thin film, graphene is formed not only on top of the nickel film, but also at the interface with the supporting Si02 layer. The films grown using this method were characterized using classical methods (Raman spectroscopy, AFM, SEM) and their conductivity is found to be close to those reported by others.

Original languageEnglish
Title of host publicationCarbon Nanotubes, Graphene, and Associated Devices II
DOIs
Publication statusPublished - 23 Nov 2009
EventCarbon Nanotubes, Graphene, and Associated Devices II - San Diego, CA, United States
Duration: 5 Aug 20096 Aug 2009

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume7399
ISSN (Print)0277-786X

Conference

ConferenceCarbon Nanotubes, Graphene, and Associated Devices II
Country/TerritoryUnited States
CitySan Diego, CA
Period5/08/096/08/09

Keywords

  • AFM
  • Graphene
  • Growth mechanism
  • PE-CVD
  • Raman
  • SEM

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