Abstract
We have studied how the increase of pressure in the deposition of polymorphous silicon can reduce the ion energy and the damage of the p-layer in p-i-n solar cells. By increasing the pressure during the deposition of the i-layer to 3 Torr, we have been able to increase the fill factor and the solar cell efficiency up to 8.4%. In an attempt to reduce the optical gap and increase further the deposition rate we have studied the use of He dilution. Changing the dilution from hydrogen to He leads to a higher deposition rate at lower rf power while keeping similar transport properties. Moreover, the lower hydrogen content of He diluted films results in a smaller band gap and a higher short circuit current in solar cells. Thus, silane-He mixtures allow to reduce the ion energy for a constant deposition rate and to minimize the damage at the p-layer and p/i interface. The cells show a fill factor of 0.69, Voc of 0.91 V, an initial efficiency of 9.3% on textured SnO2.
| Original language | English |
|---|---|
| Pages (from-to) | 668-672 |
| Number of pages | 5 |
| Journal | Journal of Non-Crystalline Solids |
| Volume | 338-340 |
| Issue number | 1 SPEC. ISS. |
| DOIs | |
| Publication status | Published - 15 Jun 2004 |
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