High efficiency thin film solar cells deposited at the amorphous-tomicrocrystalline transition using SiF4/H2/Ar gas mixtures

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Microcrystalline silicon deposited from SiF4/H2/Ar gas mixtures is used as active absorbing layer in thin film solar cells. Best solar cells are made from active layers deposited at the amorphous-to-microcrystalline transition where only a few percent of amorphous phase is present. Based on mass spectrometry measurements, we propose a simple model which accounts for the relevant features of the complex plasma chemistry: namely the depletion of H2, the formation of HF molecules and the amorphous to microcrystalline silicon transition. The specificity of SiF4/H2/Ar plasma is the ability to tightly tune the transition irrespective of the control of the deposition rate. A high crystalline fraction allows thicknesses above 3 μm with a high short-circuit current and no deterioration of the open-circuit voltage.

Original languageEnglish
Title of host publication2014 IEEE 40th Photovoltaic Specialist Conference, PVSC 2014
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages2839-2841
Number of pages3
ISBN (Electronic)9781479943982
DOIs
Publication statusPublished - 15 Oct 2014
Event40th IEEE Photovoltaic Specialist Conference, PVSC 2014 - Denver, United States
Duration: 8 Jun 201413 Jun 2014

Publication series

Name2014 IEEE 40th Photovoltaic Specialist Conference, PVSC 2014

Conference

Conference40th IEEE Photovoltaic Specialist Conference, PVSC 2014
Country/TerritoryUnited States
CityDenver
Period8/06/1413/06/14

Keywords

  • amorphous silicon
  • amorphous-to-microcrystalline transition
  • microcrystalline silicon
  • silicon tetrafluoride
  • solar-grade material

Fingerprint

Dive into the research topics of 'High efficiency thin film solar cells deposited at the amorphous-tomicrocrystalline transition using SiF4/H2/Ar gas mixtures'. Together they form a unique fingerprint.

Cite this