Abstract
We demonstrate here a simple planar aluminium-silicon strain sensor incorporating an external aluminium ohmic shunt (metal-semiconductor hybrid) which exhibits a geometrically enhanced room-temperature gauge factor (GF) of up to 843 under uni-axial tensile strains of up of 8×10-5 for a silicon p-type doping level of 1×1017cm-3. We also show that the GF is dependent on the silicon doping density; a GF of 317 being demonstrated for a p-type doping density of 1×1020 cm -3. Moreover a GF well above 1000 is possible in more lightly doped samples. The observed behaviour, to be contrasted with the gauge factor of -93 observed in homogeneous p-type silicon, is the result of the stress-induced anisotropy in the silicon conductivity that acts to deflect the current away from the metallic shunt for tensile strains.
| Original language | English |
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| Title of host publication | TRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems |
| Pages | 264-267 |
| Number of pages | 4 |
| DOIs | |
| Publication status | Published - 11 Dec 2009 |
| Event | TRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems - Denver, CO, United States Duration: 21 Jun 2009 → 25 Jun 2009 |
Publication series
| Name | TRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems |
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Conference
| Conference | TRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems |
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| Country/Territory | United States |
| City | Denver, CO |
| Period | 21/06/09 → 25/06/09 |
Keywords
- Gauge factor
- Hybrid device
- Nano/microelectromechanical systems
- Piezoresistance
- Silicon
- Strain gauge