High-Pressure, High-Temperature Phase Equilibria with Superhard Boron-Rich Compounds of B–C–N–O and B–C–Si Systems by In Situ X-ray Diffraction and CALPHAD Methodology

Alexandre Courac, Yann Le Godec, Jelena Sjakste, Nathalie Vast, Olivier Rapaud, Vladimir Turkevich

Research output: Contribution to journalReview articlepeer-review

Abstract

Boron-rich compounds within the B–C–N–O and B–C–Si systems exhibit exceptional functional properties, making them highly attractive for industrial applications such as those requiring superhardness, nuclear technologies, or thermoelectricity. High-pressure, high-temperature (HPHT) conditions allow obtaining the ingots of ceramics with best physical properties, as well as to explore advanced materials by means of in situ crystallography, high-pressure chemistry, and nanoscience. This review summarizes recent experimental and theoretical advances on high-pressure, high-temperature (HPHT) phase equilibria up to 20 GPa and 3000 K, focusing on boron carbide (B4C), boron suboxide (B6O), boron subnitride (B13N2), boron silicides, and some of their solid solutions. Emphasis is placed on in situ X-ray diffraction (XRD), density functional theory (DFT) calculations, and CALPHAD thermodynamic modeling. Despite recent progress, significant methodological challenges remain, requiring enhanced experimental accuracy and refined theoretical approaches. Future work should address these gaps to fully leverage the potential of these superhard materials.

Original languageEnglish
Pages (from-to)53013-53039
Number of pages27
JournalACS Applied Materials and Interfaces
Volume17
Issue number38
DOIs
Publication statusPublished - 24 Sept 2025

Keywords

  • CALPHAD
  • boron
  • boron-rich compounds
  • high pressure
  • in situ crystallography
  • phase diagram
  • superhard materials

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