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High tensile strain transfer into germanium microdisks using all-around strained SiN

  • Abdelhamid Ghrib
  • , Moustafa El Kurdi
  • , Mathias Prost
  • , Sébastien Sauvage
  • , Grégoire Beaudoin
  • , Ludovic Largeau
  • , Marc Chaigneau
  • , Razvigor Ossikovski
  • , Isabelle Sagnes
  • , Philippe Boucaud
  • Centre national de la recherche scientifique
  • STMicroelectronics SA, France
  • Centre de Nanosciences et de Nanotechnologies

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

We demonstrate an optimized homogeneous tensile-strain transfer into germanium microdisks up to around 1.5% biaxial strain. This is achieved by combining a bonding technique and an all-around deposition of strained silicon nitride.

Original languageEnglish
Title of host publicationIEEE International Conference on Group IV Photonics GFP
PublisherIEEE Computer Society
Pages229-230
Number of pages2
ISBN (Electronic)9781479922833
DOIs
Publication statusPublished - 18 Nov 2014
Event11th International Conference on Group IV Photonics, GFP 2014 - Paris, France
Duration: 27 Aug 201429 Aug 2014

Publication series

NameIEEE International Conference on Group IV Photonics GFP
ISSN (Print)1949-2081

Conference

Conference11th International Conference on Group IV Photonics, GFP 2014
Country/TerritoryFrance
CityParis
Period27/08/1429/08/14

Keywords

  • Raman
  • Silicon photonics
  • germanium
  • integrated laser
  • microdisk cavity
  • photoluminescence
  • strain engineering

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