Highly ordered CTAB-templated organosilicate films

Muriel Matheron; Alexis Bourgeois; Aline Brunet-Bruneau; Pierre Antoine Albouy; John Biteau; Thierry Gacoin; Jean Pierre Boilot

doi:10.1039/b510554d

Highly ordered CTAB-templated organosilicate films

Muriel Matheron
, Alexis Bourgeois
, Aline Brunet-Bruneau
, Pierre Antoine Albouy
, John Biteau
, Thierry Gacoin
, Jean Pierre Boilot

Essilor International
Sorbonne Université
Laboratoire de Physique des Solides

Research output: Contribution to journal › Article › peer-review

Abstract

Well-ordered organic-inorganic mesoporous films are prepared using an original two-step synthesis and compositions up to 50 mol% methyltriethoxysilane (MTES). These materials exhibit the three different mesostructures (2D-hexagonal, 3D-hexagonal and cubic) previously observed in the pure silica system with significant modifications of their domain of stability. During deposition and drying of organosilicate films, MTES monomers progressively condense at the internal surface of the silica clusters in agreement with the monomer-cluster growth model, leading to a significant reduction of the microporosity in the silica walls of the mesoporous structure.

Original language	English
Pages (from-to)	4741-4745
Number of pages	5
Journal	Journal of Materials Chemistry
Volume	15
Issue number	44
DOIs	https://doi.org/10.1039/b510554d
Publication status	Published - 28 Nov 2005

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title = "Highly ordered CTAB-templated organosilicate films",

abstract = "Well-ordered organic-inorganic mesoporous films are prepared using an original two-step synthesis and compositions up to 50 mol\% methyltriethoxysilane (MTES). These materials exhibit the three different mesostructures (2D-hexagonal, 3D-hexagonal and cubic) previously observed in the pure silica system with significant modifications of their domain of stability. During deposition and drying of organosilicate films, MTES monomers progressively condense at the internal surface of the silica clusters in agreement with the monomer-cluster growth model, leading to a significant reduction of the microporosity in the silica walls of the mesoporous structure.",

author = "Muriel Matheron and Alexis Bourgeois and Aline Brunet-Bruneau and Albouy, \{Pierre Antoine\} and John Biteau and Thierry Gacoin and Boilot, \{Jean Pierre\}",

year = "2005",

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doi = "10.1039/b510554d",

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volume = "15",

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journal = "Journal of Materials Chemistry",

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T1 - Highly ordered CTAB-templated organosilicate films

AU - Matheron, Muriel

AU - Bourgeois, Alexis

AU - Brunet-Bruneau, Aline

AU - Albouy, Pierre Antoine

AU - Biteau, John

AU - Gacoin, Thierry

AU - Boilot, Jean Pierre

PY - 2005/11/28

Y1 - 2005/11/28

N2 - Well-ordered organic-inorganic mesoporous films are prepared using an original two-step synthesis and compositions up to 50 mol% methyltriethoxysilane (MTES). These materials exhibit the three different mesostructures (2D-hexagonal, 3D-hexagonal and cubic) previously observed in the pure silica system with significant modifications of their domain of stability. During deposition and drying of organosilicate films, MTES monomers progressively condense at the internal surface of the silica clusters in agreement with the monomer-cluster growth model, leading to a significant reduction of the microporosity in the silica walls of the mesoporous structure.

AB - Well-ordered organic-inorganic mesoporous films are prepared using an original two-step synthesis and compositions up to 50 mol% methyltriethoxysilane (MTES). These materials exhibit the three different mesostructures (2D-hexagonal, 3D-hexagonal and cubic) previously observed in the pure silica system with significant modifications of their domain of stability. During deposition and drying of organosilicate films, MTES monomers progressively condense at the internal surface of the silica clusters in agreement with the monomer-cluster growth model, leading to a significant reduction of the microporosity in the silica walls of the mesoporous structure.

U2 - 10.1039/b510554d

DO - 10.1039/b510554d

M3 - Article

AN - SCOPUS:28144456408

SN - 0959-9428

VL - 15

SP - 4741

EP - 4745

JO - Journal of Materials Chemistry

JF - Journal of Materials Chemistry

IS - 44

ER -

Highly ordered CTAB-templated organosilicate films

Abstract

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