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Holey Graphene as a Weed Barrier for Molecules

  • Matthew L. Gethers
  • , John C. Thomas
  • , Shan Jiang
  • , Nathan O. Weiss
  • , Xiangfang Duan
  • , William A. Goddard
  • , Paul S. Weiss
  • California Institute of Technology
  • University of California, Los Angeles
  • Computer Science Department, UCLA
  • California Institute of Technology Division of Engineering and Applied Science

Research output: Contribution to journalArticlepeer-review

Abstract

We demonstrate the use of "holey" graphene as a mask against molecular adsorption. Prepared porous graphene is transferred onto a Au{111} substrate, annealed, and then exposed to dilute solutions of 1-adamantanethiol. In the pores of the graphene lattice, we find islands of organized, self-assembled molecules. The bare Au in the pores can be regenerated by postdeposition annealing, and new molecules can be self-assembled in the exposed Au region. Graphene can serve as a robust, patternable mask against the deposition of self-assembled monolayers.

Original languageEnglish
Pages (from-to)10909-10915
Number of pages7
JournalACS Nano
Volume9
Issue number11
DOIs
Publication statusPublished - 24 Nov 2015
Externally publishedYes

Keywords

  • chemical patterning
  • graphene
  • mask
  • nanoscience
  • scanning tunneling microscopy
  • self-assembly

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