Abstract
We demonstrate the use of "holey" graphene as a mask against molecular adsorption. Prepared porous graphene is transferred onto a Au{111} substrate, annealed, and then exposed to dilute solutions of 1-adamantanethiol. In the pores of the graphene lattice, we find islands of organized, self-assembled molecules. The bare Au in the pores can be regenerated by postdeposition annealing, and new molecules can be self-assembled in the exposed Au region. Graphene can serve as a robust, patternable mask against the deposition of self-assembled monolayers.
| Original language | English |
|---|---|
| Pages (from-to) | 10909-10915 |
| Number of pages | 7 |
| Journal | ACS Nano |
| Volume | 9 |
| Issue number | 11 |
| DOIs | |
| Publication status | Published - 24 Nov 2015 |
| Externally published | Yes |
Keywords
- chemical patterning
- graphene
- mask
- nanoscience
- scanning tunneling microscopy
- self-assembly
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