Hybrid kinetic/fluid modeling of silicon nanoparticles dynamics in silane plasma discharges

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Abstract

We present a fully coupled self-consistent model for the evolution of nanoparticles in a plasma-enhanced chemical vapor deposition (PECVD) reactor. The plasma is treated as a fluid while the nanoparticles are handled kinetically. The plasma fluid model is derived from kinetic theory applied to multicomponent two-temperature chemically reactive polyatomic plasmas. The model has been implemented numerically for a silane-hydrogen plasma in the early stage of nanoparticles generation.

Original languageEnglish
Title of host publication30th International Symposium on Rarefied Gas Dynamics, RGD 2016
EditorsHenning Struchtrup, Andrew Ketsdever
PublisherAmerican Institute of Physics Inc.
ISBN (Electronic)9780735414488
DOIs
Publication statusPublished - 15 Nov 2016
Event30th International Symposium on Rarefied Gas Dynamics, RGD 2016 - Victoria, Canada
Duration: 10 Jul 201615 Jul 2016

Publication series

NameAIP Conference Proceedings
Volume1786
ISSN (Print)0094-243X
ISSN (Electronic)1551-7616

Conference

Conference30th International Symposium on Rarefied Gas Dynamics, RGD 2016
Country/TerritoryCanada
CityVictoria
Period10/07/1615/07/16

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