Imaging of the optical mode of waveguiding devices by scanning near-field optical microscopy

R. Cella; B. Mersali; A. Bruno; S. Davy; H. Brückner; C. Licoppe

doi:10.1063/1.359838

Imaging of the optical mode of waveguiding devices by scanning near-field optical microscopy

R. Cella
, B. Mersali
, A. Bruno
, S. Davy
, H. Brückner
, C. Licoppe

Orange Labs

Research output: Contribution to journal › Article › peer-review

Abstract

Scanning optical microscopy with uncoated dielectric silica probe is used in the near field to investigate the propagation of optical modes along tapered integrated semiconductor optical amplifier devices and at larger working distances to study the electromagnetic intensity profile in the focal plane of various microlensed fibers. We show how this technique provides images of the mode structure of optoelectronic devices and profiled optical fibers with typical sizes in the range 2-10 μm, with an accuracy of 0.2 μm in beamwaist measurements.

Original language	English
Pages (from-to)	4339-4344
Number of pages	6
Journal	Journal of Applied Physics
Volume	78
Issue number	7
DOIs	https://doi.org/10.1063/1.359838
Publication status	Published - 1 Dec 1995
Externally published	Yes

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10.1063/1.359838

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abstract = "Scanning optical microscopy with uncoated dielectric silica probe is used in the near field to investigate the propagation of optical modes along tapered integrated semiconductor optical amplifier devices and at larger working distances to study the electromagnetic intensity profile in the focal plane of various microlensed fibers. We show how this technique provides images of the mode structure of optoelectronic devices and profiled optical fibers with typical sizes in the range 2-10 μm, with an accuracy of 0.2 μm in beamwaist measurements.",

author = "R. Cella and B. Mersali and A. Bruno and S. Davy and H. Br{\"u}ckner and C. Licoppe",

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AU - Mersali, B.

AU - Bruno, A.

AU - Davy, S.

AU - Brückner, H.

AU - Licoppe, C.

PY - 1995/12/1

Y1 - 1995/12/1

N2 - Scanning optical microscopy with uncoated dielectric silica probe is used in the near field to investigate the propagation of optical modes along tapered integrated semiconductor optical amplifier devices and at larger working distances to study the electromagnetic intensity profile in the focal plane of various microlensed fibers. We show how this technique provides images of the mode structure of optoelectronic devices and profiled optical fibers with typical sizes in the range 2-10 μm, with an accuracy of 0.2 μm in beamwaist measurements.

AB - Scanning optical microscopy with uncoated dielectric silica probe is used in the near field to investigate the propagation of optical modes along tapered integrated semiconductor optical amplifier devices and at larger working distances to study the electromagnetic intensity profile in the focal plane of various microlensed fibers. We show how this technique provides images of the mode structure of optoelectronic devices and profiled optical fibers with typical sizes in the range 2-10 μm, with an accuracy of 0.2 μm in beamwaist measurements.

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Imaging of the optical mode of waveguiding devices by scanning near-field optical microscopy

Abstract

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