In-situ IR spectroscopy to study anodic oxidation of Si(111) in KOH solution

Harold G.G. Philipsen; Jean Noël Chazalviel; Philippe Allongue; François Ozanam; John J. Kelly

doi:10.1149/1.2731217

In-situ IR spectroscopy to study anodic oxidation of Si(111) in KOH solution

Harold G.G. Philipsen
, Jean Noël Chazalviel
, Philippe Allongue
, François Ozanam
, John J. Kelly

Utrecht University

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Abstract

Fourier Transform Infrared (FTIR) spectroscopy was used to study in-situ the anodic oxidation of n-type Si(111) in KOH solution. Changes in surface chemistry were followed during oxide growth. The results are considered on the basis of a model developed from electrochemical measurements.

Original language	English
Title of host publication	ECS Transactions - 46th State-of-the-Art Program on Compound Semiconductors (SOTAPOCS XLVI) and the 2nd International Symposium on Processes at the Semiconductor-Solution Interface
Publisher	Electrochemical Society Inc.
Pages	481-488
Number of pages	8
Edition	2
ISBN (Electronic)	9781566775519
ISBN (Print)	9781566775519
DOIs	https://doi.org/10.1149/1.2731217
Publication status	Published - 1 Jan 2007
Event	46th State-of-the-Art Program on Compound Semiconductors (SOTAPOCS XLVI) and the 2nd International Symposium on Processes at the Semiconductor-Solution Interface - 211th ECS Meeting - Chicago, IL, United States Duration: 6 May 2007 → 10 May 2007

Publication series

Name	ECS Transactions
Number	2
Volume	6
ISSN (Print)	1938-5862
ISSN (Electronic)	1938-6737

Conference

Conference	46th State-of-the-Art Program on Compound Semiconductors (SOTAPOCS XLVI) and the 2nd International Symposium on Processes at the Semiconductor-Solution Interface - 211th ECS Meeting
Country/Territory	United States
City	Chicago, IL
Period	6/05/07 → 10/05/07

Access to Document

10.1149/1.2731217

Cite this

Philipsen, H. G. G., Chazalviel, J. N., Allongue, P., Ozanam, F., & Kelly, J. J. (2007). In-situ IR spectroscopy to study anodic oxidation of Si(111) in KOH solution. In ECS Transactions - 46th State-of-the-Art Program on Compound Semiconductors (SOTAPOCS XLVI) and the 2nd International Symposium on Processes at the Semiconductor-Solution Interface (2 ed., pp. 481-488). (ECS Transactions; Vol. 6, No. 2). Electrochemical Society Inc.. https://doi.org/10.1149/1.2731217

Philipsen, Harold G.G. ; Chazalviel, Jean Noël ; Allongue, Philippe et al. / In-situ IR spectroscopy to study anodic oxidation of Si(111) in KOH solution. ECS Transactions - 46th State-of-the-Art Program on Compound Semiconductors (SOTAPOCS XLVI) and the 2nd International Symposium on Processes at the Semiconductor-Solution Interface. 2. ed. Electrochemical Society Inc., 2007. pp. 481-488 (ECS Transactions; 2).

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title = "In-situ IR spectroscopy to study anodic oxidation of Si(111) in KOH solution",

abstract = "Fourier Transform Infrared (FTIR) spectroscopy was used to study in-situ the anodic oxidation of n-type Si(111) in KOH solution. Changes in surface chemistry were followed during oxide growth. The results are considered on the basis of a model developed from electrochemical measurements.",

author = "Philipsen, \{Harold G.G.\} and Chazalviel, \{Jean No{\"e}l\} and Philippe Allongue and Fran{\c c}ois Ozanam and Kelly, \{John J.\}",

year = "2007",

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doi = "10.1149/1.2731217",

language = "English",

isbn = "9781566775519",

series = "ECS Transactions",

publisher = "Electrochemical Society Inc.",

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pages = "481--488",

booktitle = "ECS Transactions - 46th State-of-the-Art Program on Compound Semiconductors (SOTAPOCS XLVI) and the 2nd International Symposium on Processes at the Semiconductor-Solution Interface",

edition = "2",

note = "46th State-of-the-Art Program on Compound Semiconductors (SOTAPOCS XLVI) and the 2nd International Symposium on Processes at the Semiconductor-Solution Interface - 211th ECS Meeting ; Conference date: 06-05-2007 Through 10-05-2007",

}

Philipsen, HGG, Chazalviel, JN, Allongue, P, Ozanam, F & Kelly, JJ 2007, In-situ IR spectroscopy to study anodic oxidation of Si(111) in KOH solution. in ECS Transactions - 46th State-of-the-Art Program on Compound Semiconductors (SOTAPOCS XLVI) and the 2nd International Symposium on Processes at the Semiconductor-Solution Interface. 2 edn, ECS Transactions, no. 2, vol. 6, Electrochemical Society Inc., pp. 481-488, 46th State-of-the-Art Program on Compound Semiconductors (SOTAPOCS XLVI) and the 2nd International Symposium on Processes at the Semiconductor-Solution Interface - 211th ECS Meeting, Chicago, IL, United States, 6/05/07. https://doi.org/10.1149/1.2731217

In-situ IR spectroscopy to study anodic oxidation of Si(111) in KOH solution. / Philipsen, Harold G.G.; Chazalviel, Jean Noël; Allongue, Philippe et al.
ECS Transactions - 46th State-of-the-Art Program on Compound Semiconductors (SOTAPOCS XLVI) and the 2nd International Symposium on Processes at the Semiconductor-Solution Interface. 2. ed. Electrochemical Society Inc., 2007. p. 481-488 (ECS Transactions; Vol. 6, No. 2).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

TY - GEN

T1 - In-situ IR spectroscopy to study anodic oxidation of Si(111) in KOH solution

AU - Philipsen, Harold G.G.

AU - Chazalviel, Jean Noël

AU - Allongue, Philippe

AU - Ozanam, François

AU - Kelly, John J.

PY - 2007/1/1

Y1 - 2007/1/1

N2 - Fourier Transform Infrared (FTIR) spectroscopy was used to study in-situ the anodic oxidation of n-type Si(111) in KOH solution. Changes in surface chemistry were followed during oxide growth. The results are considered on the basis of a model developed from electrochemical measurements.

AB - Fourier Transform Infrared (FTIR) spectroscopy was used to study in-situ the anodic oxidation of n-type Si(111) in KOH solution. Changes in surface chemistry were followed during oxide growth. The results are considered on the basis of a model developed from electrochemical measurements.

U2 - 10.1149/1.2731217

DO - 10.1149/1.2731217

M3 - Conference contribution

AN - SCOPUS:45749149539

SN - 9781566775519

T3 - ECS Transactions

SP - 481

EP - 488

BT - ECS Transactions - 46th State-of-the-Art Program on Compound Semiconductors (SOTAPOCS XLVI) and the 2nd International Symposium on Processes at the Semiconductor-Solution Interface

PB - Electrochemical Society Inc.

T2 - 46th State-of-the-Art Program on Compound Semiconductors (SOTAPOCS XLVI) and the 2nd International Symposium on Processes at the Semiconductor-Solution Interface - 211th ECS Meeting

Y2 - 6 May 2007 through 10 May 2007

ER -

Philipsen HGG, Chazalviel JN, Allongue P, Ozanam F, Kelly JJ. In-situ IR spectroscopy to study anodic oxidation of Si(111) in KOH solution. In ECS Transactions - 46th State-of-the-Art Program on Compound Semiconductors (SOTAPOCS XLVI) and the 2nd International Symposium on Processes at the Semiconductor-Solution Interface. 2 ed. Electrochemical Society Inc. 2007. p. 481-488. (ECS Transactions; 2). doi: 10.1149/1.2731217

In-situ IR spectroscopy to study anodic oxidation of Si(111) in KOH solution

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