TY - JOUR
T1 - In-situ quantitative measurements of methyl radicals in oxygen-containing reactive environments by VUV absorption spectroscopy using synchrotron radiation
AU - Budde, Maik
AU - Sadi, Dihya
AU - de Oliveira, Nelson
AU - Bois, Sophie
AU - Tardat, Mathéo
AU - Garcia-Soto, Carolina A.
AU - Curley, Garrett A.
AU - Baratte, Edmond
AU - Guaitella, Olivier
N1 - Publisher Copyright:
© 2025 Elsevier B.V.
PY - 2025/11/16
Y1 - 2025/11/16
N2 - Absolute methyl radical number densities are measured in-situ in a low-temperature discharge in methane and oxygen diluted in argon/helium, using vacuum ultraviolet synchrotron radiation absorption spectroscopy. Instead of the methyl absorption band around 216 nm, the exploitation of the more sensitive band at 150 nm is demonstrated. Densities as low as (1.6 ± 0.2) × 1013 cm-2 are detected. With oxygen admixture, the expected monotonous decrease of CH3 density is not observed, but a distinct maximum at a few percent of oxygen, separating a regime dominated by the electron kinetics for low percentages from an oxidation-dominated regime at higher admixtures.
AB - Absolute methyl radical number densities are measured in-situ in a low-temperature discharge in methane and oxygen diluted in argon/helium, using vacuum ultraviolet synchrotron radiation absorption spectroscopy. Instead of the methyl absorption band around 216 nm, the exploitation of the more sensitive band at 150 nm is demonstrated. Densities as low as (1.6 ± 0.2) × 1013 cm-2 are detected. With oxygen admixture, the expected monotonous decrease of CH3 density is not observed, but a distinct maximum at a few percent of oxygen, separating a regime dominated by the electron kinetics for low percentages from an oxidation-dominated regime at higher admixtures.
KW - In-situ VUV absorption spectroscopy
KW - Methyl radical
KW - Oxidation
KW - Synchrotron radiation
UR - https://www.scopus.com/pages/publications/105014924635
U2 - 10.1016/j.cplett.2025.142388
DO - 10.1016/j.cplett.2025.142388
M3 - Article
AN - SCOPUS:105014924635
SN - 0009-2614
VL - 879
JO - Chemical Physics Letters
JF - Chemical Physics Letters
M1 - 142388
ER -