Influence of the dilute-phase SiH bond concentration on the steady-state defect density in a-Si:H

Christian Godet, Phil Morin, Pere Roca I Cabarrocas

Research output: Contribution to journalArticlepeer-review

Abstract

In the field of the stability of a-Si:H, the received wisdom is that a high clustered-phase SiH concentration is to be avoided. In this high-intensity illumination study of a-Si:H films grown using different techniques, it is found that the steady-state defect density is proportional to the dilute-phase concentration [SiH]d below ≈ 16%. A model is proposed to quantify the participation of the different H-bonding configurations in the metastability phenomena. It predicts a steady-state defect density proportional to [SiH]d and accurately describes the recently observed changes in the infrared absorption of the various H-bonding configurations during light-soaking.

Original languageEnglish
Pages (from-to)449-452
Number of pages4
JournalJournal of Non-Crystalline Solids
Volume198-200
Issue numberPART 1
DOIs
Publication statusPublished - 1 Jan 1996

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