TY - GEN
T1 - Intermediate-Pressure O2 RFCCP:Different Power and pressure
AU - Zhang, S.
AU - Curley, G.
AU - Booth, J. P.
N1 - Publisher Copyright:
© 2024 IEEE.
PY - 2024/1/1
Y1 - 2024/1/1
N2 - Radio frequency (RF) capacitively coupled plasma (CCP) sources are of great relevance due to their numerous industrial applications[1]. However, previous research has focused on pressures below 1 Torr, due to the difficulty of common diagnostics at higher pressures. We have measured oxygen atom densities and temperatures by cavity ringdown spectroscopy (CRDS) at 630nm[2], combined with electrical measurements of the plasma impedance and ion fluxes in O2 plasmas over the pressure range 1-6 Torr and 100-650W RF power at 13.56MHz.
AB - Radio frequency (RF) capacitively coupled plasma (CCP) sources are of great relevance due to their numerous industrial applications[1]. However, previous research has focused on pressures below 1 Torr, due to the difficulty of common diagnostics at higher pressures. We have measured oxygen atom densities and temperatures by cavity ringdown spectroscopy (CRDS) at 630nm[2], combined with electrical measurements of the plasma impedance and ion fluxes in O2 plasmas over the pressure range 1-6 Torr and 100-650W RF power at 13.56MHz.
U2 - 10.1109/ICOPS58192.2024.10626210
DO - 10.1109/ICOPS58192.2024.10626210
M3 - Conference contribution
AN - SCOPUS:85202854642
T3 - IEEE International Conference on Plasma Science
BT - ICOPS 2024 - 51st IEEE International Conference on Plasma Science and 4th Asia-Pacific Conference on Plasma and Terahertz Science, APCOPTS 2024
PB - Institute of Electrical and Electronics Engineers Inc.
T2 - 51st IEEE International Conference on Plasma Science, ICOPS 2024 and 4th Asia-Pacific Conference on Plasma and Terahertz Science, APCOPTS 2024
Y2 - 16 June 2024 through 20 June 2024
ER -