Abstract
Thin amorphous silicon (a-Si:H) and carbonated silicon (a-Si1-xCx:H) layers were deposited on stainless steel substrates using plasma-enhanced chemical vapour deposition (PECVD) in a "low-power" regime. The carbon content of the carbonated silicon (a-Si1-xCx:H) alloys was varied between 0.1 and 0.37at.%. The performance of these interfaces as effective corrosion barriers in 3% sodium chloride aqueous solutions was evaluated. Potentiodynamic polarisation curves and electrochemical impedance spectroscopy (EIS) were used next to X-ray photoelectron spectroscopy (XPS) and scanning electron microscopy (SEM) to investigate the protection efficiency of the different barriers. The a-Si:H coated showed better corrosion resistance as compared to the carbonated silicon alloys. No degradation was observed after 14days immersion of the steel substrate coated with a-Si:H in 3% sodium chloride aqueous solution, making this coating an attractive candidate as corrosion barrier.
| Original language | English |
|---|---|
| Pages (from-to) | 3626-3631 |
| Number of pages | 6 |
| Journal | Surface and Coatings Technology |
| Volume | 206 |
| Issue number | 17 |
| DOIs | |
| Publication status | Published - 25 Apr 2012 |
Keywords
- Amorphous carbonated silicon alloys
- Amorphous silicon
- Corrosion inhibition
- Electrochemistry
- Steel
- Thin films