Investigation of the transition of amorphous Ti-thiolate prepared by hybrid atomic layer deposition/molecular layer deposition into titanium disulfide ultrathin film

Petros Abi Younes; Ashok Kumar Yadav; Medet Zhukush; Van Hoan Le; Hervé Roussel; Marie Ingrid Richard; Clément Camp; Kai Szeto; Gianluca Ciatto; Nathanaelle Schneider; Elsje Alessandra Quadrelli; Hubert Renevier; Nicolas Gauthier

doi:10.1116/6.0002448

Investigation of the transition of amorphous Ti-thiolate prepared by hybrid atomic layer deposition/molecular layer deposition into titanium disulfide ultrathin film

Petros Abi Younes
, Ashok Kumar Yadav
, Medet Zhukush
, Van Hoan Le
, Hervé Roussel
, Marie Ingrid Richard
, Clément Camp
, Kai Szeto
, Gianluca Ciatto
, Nathanaelle Schneider
, Elsje Alessandra Quadrelli
, Hubert Renevier
, Nicolas Gauthier

Research output: Contribution to journal › Article › peer-review

Abstract

Amorphous organic-inorganic hybrid thin films (Ti-thiolate) deposited on thermal SiO 2 substrate by atomic layer deposition/molecular layer deposition are converted into textured titanium disulfide (TiS 2) ultrathin films, of thickness down to 5.5 nm, upon annealing under Ar/H 2 (5%) atmosphere at mild temperature ( 300 °C). Two annealing strategies were investigated by in situ synchrotron x-ray fluorescence, allowing us to master the mineralization of the amorphous Ti-thiolate into titanium disulfide. Stoichiometry and crystallinity of the thin films were characterized by x-ray photoelectron spectroscopies, Raman scattering, and x-ray absorption at the S K-edge. Lamellar structure parallel to the substrate surface was observed by transmission electron microscopy.

Original language	English
Article number	042403
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	41
Issue number	4
DOIs	https://doi.org/10.1116/6.0002448
Publication status	Published - 1 Jul 2023

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Abi Younes, P., Yadav, A. K., Zhukush, M., Le, V. H., Roussel, H., Richard, M. I., Camp, C., Szeto, K., Ciatto, G., Schneider, N., Quadrelli, E. A., Renevier, H., & Gauthier, N. (2023). Investigation of the transition of amorphous Ti-thiolate prepared by hybrid atomic layer deposition/molecular layer deposition into titanium disulfide ultrathin film. Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 41(4), Article 042403. https://doi.org/10.1116/6.0002448

@article{e09a60fc179a4682a7906cd9c864f26e,

title = "Investigation of the transition of amorphous Ti-thiolate prepared by hybrid atomic layer deposition/molecular layer deposition into titanium disulfide ultrathin film",

abstract = "Amorphous organic-inorganic hybrid thin films (Ti-thiolate) deposited on thermal SiO 2 substrate by atomic layer deposition/molecular layer deposition are converted into textured titanium disulfide (TiS 2) ultrathin films, of thickness down to 5.5 nm, upon annealing under Ar/H 2 (5\%) atmosphere at mild temperature ( 300 °C). Two annealing strategies were investigated by in situ synchrotron x-ray fluorescence, allowing us to master the mineralization of the amorphous Ti-thiolate into titanium disulfide. Stoichiometry and crystallinity of the thin films were characterized by x-ray photoelectron spectroscopies, Raman scattering, and x-ray absorption at the S K-edge. Lamellar structure parallel to the substrate surface was observed by transmission electron microscopy.",

author = "\{Abi Younes\}, Petros and Yadav, \{Ashok Kumar\} and Medet Zhukush and Le, \{Van Hoan\} and Herv{\'e} Roussel and Richard, \{Marie Ingrid\} and Cl{\'e}ment Camp and Kai Szeto and Gianluca Ciatto and Nathanaelle Schneider and Quadrelli, \{Elsje Alessandra\} and Hubert Renevier and Nicolas Gauthier",

note = "Publisher Copyright: {\textcopyright} 2023 Author(s).",

year = "2023",

month = jul,

day = "1",

doi = "10.1116/6.0002448",

language = "English",

volume = "41",

journal = "Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films",

issn = "0734-2101",

number = "4",

}

Abi Younes, P, Yadav, AK, Zhukush, M, Le, VH, Roussel, H, Richard, MI, Camp, C, Szeto, K, Ciatto, G, Schneider, N, Quadrelli, EA, Renevier, H & Gauthier, N 2023, 'Investigation of the transition of amorphous Ti-thiolate prepared by hybrid atomic layer deposition/molecular layer deposition into titanium disulfide ultrathin film', Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, vol. 41, no. 4, 042403. https://doi.org/10.1116/6.0002448

Investigation of the transition of amorphous Ti-thiolate prepared by hybrid atomic layer deposition/molecular layer deposition into titanium disulfide ultrathin film. / Abi Younes, Petros; Yadav, Ashok Kumar; Zhukush, Medet et al.
In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 41, No. 4, 042403, 01.07.2023.

Research output: Contribution to journal › Article › peer-review

TY - JOUR

T1 - Investigation of the transition of amorphous Ti-thiolate prepared by hybrid atomic layer deposition/molecular layer deposition into titanium disulfide ultrathin film

AU - Abi Younes, Petros

AU - Yadav, Ashok Kumar

AU - Zhukush, Medet

AU - Le, Van Hoan

AU - Roussel, Hervé

AU - Richard, Marie Ingrid

AU - Camp, Clément

AU - Szeto, Kai

AU - Ciatto, Gianluca

AU - Schneider, Nathanaelle

AU - Quadrelli, Elsje Alessandra

AU - Renevier, Hubert

AU - Gauthier, Nicolas

PY - 2023/7/1

Y1 - 2023/7/1

N2 - Amorphous organic-inorganic hybrid thin films (Ti-thiolate) deposited on thermal SiO 2 substrate by atomic layer deposition/molecular layer deposition are converted into textured titanium disulfide (TiS 2) ultrathin films, of thickness down to 5.5 nm, upon annealing under Ar/H 2 (5%) atmosphere at mild temperature ( 300 °C). Two annealing strategies were investigated by in situ synchrotron x-ray fluorescence, allowing us to master the mineralization of the amorphous Ti-thiolate into titanium disulfide. Stoichiometry and crystallinity of the thin films were characterized by x-ray photoelectron spectroscopies, Raman scattering, and x-ray absorption at the S K-edge. Lamellar structure parallel to the substrate surface was observed by transmission electron microscopy.

AB - Amorphous organic-inorganic hybrid thin films (Ti-thiolate) deposited on thermal SiO 2 substrate by atomic layer deposition/molecular layer deposition are converted into textured titanium disulfide (TiS 2) ultrathin films, of thickness down to 5.5 nm, upon annealing under Ar/H 2 (5%) atmosphere at mild temperature ( 300 °C). Two annealing strategies were investigated by in situ synchrotron x-ray fluorescence, allowing us to master the mineralization of the amorphous Ti-thiolate into titanium disulfide. Stoichiometry and crystallinity of the thin films were characterized by x-ray photoelectron spectroscopies, Raman scattering, and x-ray absorption at the S K-edge. Lamellar structure parallel to the substrate surface was observed by transmission electron microscopy.

U2 - 10.1116/6.0002448

DO - 10.1116/6.0002448

M3 - Article

AN - SCOPUS:85162862069

SN - 0734-2101

VL - 41

JO - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

JF - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

IS - 4

M1 - 042403

ER -

Investigation of the transition of amorphous Ti-thiolate prepared by hybrid atomic layer deposition/molecular layer deposition into titanium disulfide ultrathin film

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