Abstract
Using particle-in-cell simulations, we predict that it is possible to obtain a significant difference between the ion flux to the powered electrode and that to the grounded electrode - with about 50% higher ion flux on one electrode - in a geometrically symmetric, radiofrequency capacitively-coupled plasma reactor by applying a non-sinusoidal, 'Tailored' voltage waveform. This sawtooth-like waveform presents different rising and falling slopes over one cycle. We show that this effect is due to differing plasma sheath motion in front of each electrode, which induces a higher ionization rate in front of the electrode which has the fastest positive rising voltage. Together with the higher ion flux comes a lower voltage drop across the sheath, and therefore a reduced maximum ion bombardment energy; a result in contrast to typical process control mechanisms.
| Original language | English |
|---|---|
| Article number | 065010 |
| Journal | Plasma Sources Science and Technology |
| Volume | 23 |
| Issue number | 6 |
| DOIs | |
| Publication status | Published - 1 Dec 2014 |
Keywords
- Capacivitely-coupled plasma
- Electron heating
- Ion flux asymmetry
- PIC modelling
- Tailored voltage waveforms