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Laser induced fluorescence detection of CF and CF2 radicals in a CF4/O2 plasma

  • University of Oxford

Research output: Contribution to journalArticlepeer-review

62 Citations (Scopus)

Abstract

Laser induced fluorescence has been used to detect ground-state CF and CF2 radicals in a CF4/O2 plasma etching reactor. Measurements are reported of the spatial variation of CF2 concentrations, of the CF radical rotational state distributions, and of the variation of both species with O2 content of the plasma.

Original languageEnglish
Pages (from-to)318-319
Number of pages2
JournalApplied Physics Letters
Volume50
Issue number6
DOIs
Publication statusPublished - 1 Dec 1987
Externally publishedYes

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