Laser-induced fluorescence ion diagnostics in light of plasma processing

R. McWilliams; J. P. Booth; E. A. Hudson; J. Thomas; D. Zimmerman

doi:10.1016/j.tsf.2006.10.027

Laser-induced fluorescence ion diagnostics in light of plasma processing

R. McWilliams, J. P. Booth, E. A. Hudson, J. Thomas, D. Zimmerman

Research output: Contribution to journal › Article › peer-review

Abstract

A brief overview of non-perturbing light diagnostics is followed by recent examples of process plasma properties measured via laser-induced fluorescence (LIF), optical emission, and absorption spectroscopy. Examples include radical density measurement via absorption and emission spectroscopy. With LIF, examples show properties of ion beam etching sources and ion velocity angle variations in ICP sheaths near a process surface. Because of the wide range of process plasma parameters, appropriate choice of light diagnostics varies.

Original language	English
Pages (from-to)	4860-4863
Number of pages	4
Journal	Thin Solid Films
Volume	515
Issue number	12
DOIs	https://doi.org/10.1016/j.tsf.2006.10.027
Publication status	Published - 23 Apr 2007

Keywords

Laser-induced fluorescence
Plasma spectroscopy

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10.1016/j.tsf.2006.10.027

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title = "Laser-induced fluorescence ion diagnostics in light of plasma processing",

abstract = "A brief overview of non-perturbing light diagnostics is followed by recent examples of process plasma properties measured via laser-induced fluorescence (LIF), optical emission, and absorption spectroscopy. Examples include radical density measurement via absorption and emission spectroscopy. With LIF, examples show properties of ion beam etching sources and ion velocity angle variations in ICP sheaths near a process surface. Because of the wide range of process plasma parameters, appropriate choice of light diagnostics varies.",

keywords = "Laser-induced fluorescence, Plasma spectroscopy",

author = "R. McWilliams and Booth, \{J. P.\} and Hudson, \{E. A.\} and J. Thomas and D. Zimmerman",

year = "2007",

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doi = "10.1016/j.tsf.2006.10.027",

language = "English",

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journal = "Thin Solid Films",

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AU - McWilliams, R.

AU - Booth, J. P.

AU - Hudson, E. A.

AU - Thomas, J.

AU - Zimmerman, D.

PY - 2007/4/23

Y1 - 2007/4/23

N2 - A brief overview of non-perturbing light diagnostics is followed by recent examples of process plasma properties measured via laser-induced fluorescence (LIF), optical emission, and absorption spectroscopy. Examples include radical density measurement via absorption and emission spectroscopy. With LIF, examples show properties of ion beam etching sources and ion velocity angle variations in ICP sheaths near a process surface. Because of the wide range of process plasma parameters, appropriate choice of light diagnostics varies.

AB - A brief overview of non-perturbing light diagnostics is followed by recent examples of process plasma properties measured via laser-induced fluorescence (LIF), optical emission, and absorption spectroscopy. Examples include radical density measurement via absorption and emission spectroscopy. With LIF, examples show properties of ion beam etching sources and ion velocity angle variations in ICP sheaths near a process surface. Because of the wide range of process plasma parameters, appropriate choice of light diagnostics varies.

KW - Laser-induced fluorescence

KW - Plasma spectroscopy

U2 - 10.1016/j.tsf.2006.10.027

DO - 10.1016/j.tsf.2006.10.027

M3 - Article

AN - SCOPUS:33947176043

SN - 0040-6090

VL - 515

SP - 4860

EP - 4863

JO - Thin Solid Films

JF - Thin Solid Films

IS - 12

ER -

Laser-induced fluorescence ion diagnostics in light of plasma processing

Abstract

Keywords

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