Abstract
We report on the uniformity improvement of InAs quantum dashes (QDHs) grown by molecular beam epitaxy on InP (100) through optimizing double cap technique. Broad-area lasers were fabricated with an emission wavelength of 1.58 μm. A threshold current density of 360 A/ cm2 was achieved for a five stack QDH structure and a cavity length of 1.2 mm. This results from a reduced inhomogeneous broadening (62 meV) and lower internal optical losses (7 cm -1). The achievement paves the way toward ultralow threshold semiconductor laser for telecommunications.
| Original language | English |
|---|---|
| Article number | 081107 |
| Journal | Applied Physics Letters |
| Volume | 94 |
| Issue number | 8 |
| DOIs | |
| Publication status | Published - 6 Mar 2009 |
| Externally published | Yes |
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